Abstract
Monolayer graphene oxide (mGO) is shown to effectively protect molecular thin films from reorganization and function as an atomically thin barrier for vapor-deposited Ti/Al metal top electrodes. Fragile organic Langmuir–Blodgett (LB) films of C22 fatty acid cadmium salts (cadmium(II) behenate) were covered by a compressed mosaic LB film of mGO flakes. These hybrid LB films were examined with atomic force microscopy (AFM) and X-ray reflectivity, both with and without the metal top electrodes. While the AFM enabled surface and morphology analysis, the X-ray reflectivity allowed for a detailed structural depth profiling of the organic film and mGO layer below the metal top layers. The structure of the mGO-protected LB films was found to be perfectly preserved; in contrast, it has previously been shown that metal deposition completely destroys the first two LB layers of unprotected films. This study provides clear evidence of the efficient protection offered by a single atomic layer of GO.
| Original language | English |
|---|---|
| Journal | A C S Nano |
| Volume | 6 |
| Issue number | 9 |
| Pages (from-to) | 8022-8029 |
| ISSN | 1936-0851 |
| DOIs | |
| Publication status | Published - 2012 |
Keywords
- graphene oxide
- molecular electronics
- vertical devices
- barrier layer
- molecular interfacing
- X-ray reflectivity
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