Graphene Oxide as a Monoatomic Blocking Layer

Søren Petersen, Magni Glyvradal, Peter Bøggild, Wenping Hu, Robert Feidenhans'l, Bo W. Laursen

    Research output: Contribution to journalJournal articleResearchpeer-review

    Abstract

    Monolayer graphene oxide (mGO) is shown to effectively protect molecular thin films from reorganization and function as an atomically thin barrier for vapor-deposited Ti/Al metal top electrodes. Fragile organic Langmuir–Blodgett (LB) films of C22 fatty acid cadmium salts (cadmium(II) behenate) were covered by a compressed mosaic LB film of mGO flakes. These hybrid LB films were examined with atomic force microscopy (AFM) and X-ray reflectivity, both with and without the metal top electrodes. While the AFM enabled surface and morphology analysis, the X-ray reflectivity allowed for a detailed structural depth profiling of the organic film and mGO layer below the metal top layers. The structure of the mGO-protected LB films was found to be perfectly preserved; in contrast, it has previously been shown that metal deposition completely destroys the first two LB layers of unprotected films. This study provides clear evidence of the efficient protection offered by a single atomic layer of GO.
    Original languageEnglish
    JournalA C S Nano
    Volume6
    Issue number9
    Pages (from-to)8022-8029
    ISSN1936-0851
    DOIs
    Publication statusPublished - 2012

    Keywords

    • graphene oxide
    • molecular electronics
    • vertical devices
    • barrier layer
    • molecular interfacing
    • X-ray reflectivity

    Cite this

    Petersen, S., Glyvradal, M., Bøggild, P., Hu, W., Feidenhans'l, R., & Laursen, B. W. (2012). Graphene Oxide as a Monoatomic Blocking Layer. A C S Nano, 6(9), 8022-8029. https://doi.org/10.1021/nn302628q