Abstract
This work investigates methods for obtaining reliably clean gold film surfaces. Nine gold cleaning methods are investigated here: UV ozone photoreactor; potassium hydroxide-hydrogen peroxide; potassium hydroxide potential sweep; sulfuric acid hydrogen peroxide; sulfuric acid potential cycling; hydrochloric acid potential cycling; dimethylamine borane reducing agent solutions at 25 and 65 degrees C; and a dilute form of Aqua Regia. Peak-current potential-differences obtained from cyclic voltammetry and charge transfer resistance obtained from electrochemical impedance spectroscopy, as well as X-ray photo-electron spectroscopy are used to characterize surface cleanliness. A low peak-current potential-difference and charge transfer resistance indicates a cleaner surface, as does a higher percentage of elemental gold on the electrode surface. The potassium hydroxide potential sweep method is found to leave the gold surface the cleanest overall.
| Original language | English |
|---|---|
| Journal | Microelectronic Engineering |
| Volume | 86 |
| Issue number | 4-6 |
| Pages (from-to) | 1282-1285 |
| ISSN | 0167-9317 |
| DOIs | |
| Publication status | Published - 2009 |
| Event | 34th International Conference on Micro and Nano Engineering - Athens, Greece Duration: 15 Sept 2008 → 18 Sept 2008 Conference number: 34 |
Conference
| Conference | 34th International Conference on Micro and Nano Engineering |
|---|---|
| Number | 34 |
| Country/Territory | Greece |
| City | Athens |
| Period | 15/09/2008 → 18/09/2008 |
Keywords
- Cyclic Voltammetry
- Gold Cleaning
- Impedance Spectroscopy
- Electrochemistry
Fingerprint
Dive into the research topics of 'Gold Cleaning Methods for Electrochemical Detection Applications'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver