Gold Cleaning Methods for Electrochemical Detection Applications

Lee MacKenzie Fischer, Maria Tenje, Arto Heiskanen, Noriyuki Masuda, Jaime Castillo, Anders Bentien, Jenny Emnéus, Mogens Havsteen Jakobsen, Anja Boisen

    Research output: Contribution to journalConference articleResearchpeer-review

    Abstract

    This work investigates methods for obtaining reliably clean gold film surfaces. Nine gold cleaning methods are investigated here: UV ozone photoreactor; potassium hydroxide-hydrogen peroxide; potassium hydroxide potential sweep; sulfuric acid hydrogen peroxide; sulfuric acid potential cycling; hydrochloric acid potential cycling; dimethylamine borane reducing agent solutions at 25 and 65 degrees C; and a dilute form of Aqua Regia. Peak-current potential-differences obtained from cyclic voltammetry and charge transfer resistance obtained from electrochemical impedance spectroscopy, as well as X-ray photo-electron spectroscopy are used to characterize surface cleanliness. A low peak-current potential-difference and charge transfer resistance indicates a cleaner surface, as does a higher percentage of elemental gold on the electrode surface. The potassium hydroxide potential sweep method is found to leave the gold surface the cleanest overall.
    Original languageEnglish
    JournalMicroelectronic Engineering
    Volume86
    Issue number4-6
    Pages (from-to)1282-1285
    ISSN0167-9317
    DOIs
    Publication statusPublished - 2009
    Event34th International Conference on Micro and Nano Engineering - Athens, Greece
    Duration: 15 Sep 200818 Sep 2008
    Conference number: 34

    Conference

    Conference34th International Conference on Micro and Nano Engineering
    Number34
    CountryGreece
    CityAthens
    Period15/09/200818/09/2008

    Keywords

    • Cyclic Voltammetry
    • Gold Cleaning
    • Impedance Spectroscopy
    • Electrochemistry

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