Abstract
A detailed mechanism for the thermal decomposition and oxidation of the
flame intermediate glyoxal (OCHCHO) has been assembled from available
theoretical and experimental literature data. The modeling capabilities
of this extensive mechanism have been tested by simulating experimental
HCO profiles measured at intermediate and high temperatures in previous
glyoxal photolysis and pyrolysis studies. Additionally, new experiments
on glyoxal pyrolysis and oxidation have been performed with glyoxal and
glyoxal/oxygen mixtures in Ar behind shock waves at temperatures of
1285–1760 K at two different total density ranges. HCO
concentration–time profiles have been detected by frequency modulation
spectroscopy at a wavelength of λ = 614.752 nm. The temperature range of
available direct rate constant data of the high-temperature key
reaction HCO + O2 → CO + HO2 has been extended up
to 1705 K and confirms a temperature dependence consistent with a
dominating direct abstraction channel. Taking into account available
literature data obtained at lower temperatures, the following rate
constant expression is recommended over the temperature range 295 K <
T < 1705 K: k1/(cm3 mol–1 s–1) = 6.92 × 106 × T1.90 × exp(+5.73 kJ/mol/RT). At intermediate temperatures, the reaction OCHCHO + HO2
becomes more important. A detailed reanalysis of previous experimental
data as well as more recent theoretical predictions favor the formation
of a recombination product in contrast to the formerly assumed
dominating and fast OH-forming channel. Modeling results of the present
study support the formation of HOCH(OO)CHO and provide a 2 orders of
magnitude lower rate constant estimate for the OH channel. Hence,
low-temperature generation of chain carriers has to be attributed to
secondary reactions of HOCH(OO)CHO.
| Original language | English |
|---|---|
| Journal | Journal of Physical Chemistry Part A: Molecules, Spectroscopy, Kinetics, Environment and General Theory |
| Volume | 119 |
| Issue number | 28 |
| Pages (from-to) | 7305-7315 |
| ISSN | 1089-5639 |
| DOIs | |
| Publication status | Published - 2015 |