Global optimization of silicon nanowires for efficient parametric processes

Dragana Vukovic; Jing Xu; Jesper Mørk; Leif Katsuo Oxenløwe; Christophe Peucheret

doi:10.1109/Group4.2013.6644456

Global optimization of silicon nanowires for efficient parametric processes

Dragana Vukovic, Jing Xu, Jesper Mørk, Leif Katsuo Oxenløwe, Christophe Peucheret

Research output: Chapter in Book/Report/Conference proceeding › Article in proceedings › Research › peer-review

Abstract

We present a global optimization of silicon nanowires for parametric single-pump mixing. For the first time, the effect of surface roughness-induced loss is included in the analysis, significantly influencing the optimum waveguide dimensions.

Original language	English
Title of host publication	2013 IEEE 10th International Conference on Group IV Photonics (GFP)
Publisher	IEEE
Publication date	2013
Pages	115-117
ISBN (Print)	978-1-4673-5803-3
DOIs	https://doi.org/10.1109/Group4.2013.6644456
Publication status	Published - 2013
Event	2013 10th IEEE International Conference on Group IV Photonics - Seoul, Korea, Republic of Duration: 28 Aug 2013 → 30 Aug 2013 Conference number: 10 https://ieeexplore.ieee.org/xpl/conhome/6621626/proceeding

Conference

Conference	2013 10th IEEE International Conference on Group IV Photonics
Number	10
Country/Territory	Korea, Republic of
City	Seoul
Period	28/08/2013 → 30/08/2013
Internet address	https://ieeexplore.ieee.org/xpl/conhome/6621626/proceeding

Keywords

Silicon nanowires
Four-wave mixing

Access to Document

10.1109/Group4.2013.6644456

OpenUrl availability

Full text

Cite this

@inproceedings{204de93046f24bc8a8fbe7cd1e964bc7,

title = "Global optimization of silicon nanowires for efficient parametric processes",

abstract = "We present a global optimization of silicon nanowires for parametric single-pump mixing. For the first time, the effect of surface roughness-induced loss is included in the analysis, significantly influencing the optimum waveguide dimensions.",

keywords = "Silicon nanowires, Four-wave mixing",

author = "Dragana Vukovic and Jing Xu and Jesper M{\o}rk and Oxenl{\o}we, {Leif Katsuo} and Christophe Peucheret",

year = "2013",

doi = "10.1109/Group4.2013.6644456",

language = "English",

isbn = "978-1-4673-5803-3 ",

pages = "115--117",

booktitle = "2013 IEEE 10th International Conference on Group IV Photonics (GFP)",

publisher = "IEEE",

address = "United States",

note = "2013 10th IEEE International Conference on Group IV Photonics, GFP 2013 ; Conference date: 28-08-2013 Through 30-08-2013",

url = "https://ieeexplore.ieee.org/xpl/conhome/6621626/proceeding",

}

Vukovic, D, Xu, J, Mørk, J , Oxenløwe, LK & Peucheret, C 2013, Global optimization of silicon nanowires for efficient parametric processes. in 2013 IEEE 10th International Conference on Group IV Photonics (GFP). IEEE, pp. 115-117, 2013 10th IEEE International Conference on Group IV Photonics, Seoul, Korea, Republic of, 28/08/2013. https://doi.org/10.1109/Group4.2013.6644456

TY - GEN

T1 - Global optimization of silicon nanowires for efficient parametric processes

AU - Vukovic, Dragana

AU - Xu, Jing

AU - Mørk, Jesper

AU - Oxenløwe, Leif Katsuo

AU - Peucheret, Christophe

N1 - Conference code: 10

PY - 2013

Y1 - 2013

N2 - We present a global optimization of silicon nanowires for parametric single-pump mixing. For the first time, the effect of surface roughness-induced loss is included in the analysis, significantly influencing the optimum waveguide dimensions.

AB - We present a global optimization of silicon nanowires for parametric single-pump mixing. For the first time, the effect of surface roughness-induced loss is included in the analysis, significantly influencing the optimum waveguide dimensions.

KW - Silicon nanowires

KW - Four-wave mixing

U2 - 10.1109/Group4.2013.6644456

DO - 10.1109/Group4.2013.6644456

M3 - Article in proceedings

SN - 978-1-4673-5803-3

SP - 115

EP - 117

BT - 2013 IEEE 10th International Conference on Group IV Photonics (GFP)

PB - IEEE

T2 - 2013 10th IEEE International Conference on Group IV Photonics

Y2 - 28 August 2013 through 30 August 2013

ER -

Global optimization of silicon nanowires for efficient parametric processes

Abstract

Conference

Keywords

Access to Document

OpenUrl availability

Fingerprint

Cite this