Functionalized SU-8 patterned with X-ray Lithography

Søren Balslev, F. Romanato

    Research output: Contribution to journalJournal articleResearchpeer-review

    Abstract

    In this work we demonstrate the feasibility of x-ray lithography on SU-8 photoresist doped with the laser dye Rhodamine 6G, while retaining the photoactive properties of the embedded dye. Two kinds of structures are fabricated via soft x-ray lithography and characterized: a laser and in amplified spontaneous emission light source that couples out light normal to the chip plane. In addition we examine the influence of the x-ray irradiation on the fluorescence of thin films of dye doped SU-8. The dye embedded in the SU-8 is optically excited during, characterization by an external light source tuned to the absorption band of the dye. (c) 2005 American Iaviuon SocietY.
    Original languageEnglish
    JournalJournal of Vacuum Science and Technolgy Vol
    Volume23
    Pages (from-to)2944-2949
    ISSN1071-1023
    Publication statusPublished - 2005

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