From Block Copolymers to Nano-porous Materials

Martin Etchells Vigild; Sokol Ndoni; Rolf Henrik Berg

From Block Copolymers to Nano-porous Materials

Martin Etchells Vigild, Sokol Ndoni, Rolf Henrik Berg

Research output: Chapter in Book/Report/Conference proceeding › Conference abstract in proceedings › Research

Abstract

Quantitative etching of the polydimethylsiloxane block in a series of polystyrene-polydimethylsiloxane (PS-PDMS) block copolymers is reported. Reacting the block copolymer with anhydrous hydrogen fluoride (HF) renders a nanoporous material with the remaining PS maintaining the original morphology in the bulk. The method is very accurate for analytical determination of the PDMS content in the samples. Several morphologies (BCC, HEX and Gyroid) are conserved in the resulting glassy PS-matrix, as ascertained by small angle X-ray scattering. Especially, films of mm thickness containing secluded spherical nm wide holes of BCC symmetry are produced by this procedure.

Original language	English
Title of host publication	Book of Abstracts
Publication date	2003
Publication status	Published - 2003
Event	Danske Krystallografmøde - Copnhagen, Denmark Duration: 1 Jan 2003 → … Conference number: 33

Conference

Conference	Danske Krystallografmøde
Number	33
City	Copnhagen, Denmark
Period	01/01/2003 → …

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title = "From Block Copolymers to Nano-porous Materials",

abstract = "Quantitative etching of the polydimethylsiloxane block in a series of polystyrene-polydimethylsiloxane (PS-PDMS) block copolymers is reported. Reacting the block copolymer with anhydrous hydrogen fluoride (HF) renders a nanoporous material with the remaining PS maintaining the original morphology in the bulk. The method is very accurate for analytical determination of the PDMS content in the samples. Several morphologies (BCC, HEX and Gyroid) are conserved in the resulting glassy PS-matrix, as ascertained by small angle X-ray scattering. Especially, films of mm thickness containing secluded spherical nm wide holes of BCC symmetry are produced by this procedure.",

author = "Vigild, {Martin Etchells} and Sokol Ndoni and Berg, {Rolf Henrik}",

year = "2003",

language = "English",

booktitle = "Book of Abstracts",

note = "Danske Krystallografm{\o}de ; Conference date: 01-01-2003",

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T1 - From Block Copolymers to Nano-porous Materials

AU - Vigild, Martin Etchells

AU - Ndoni, Sokol

AU - Berg, Rolf Henrik

N1 - Conference code: 33

PY - 2003

Y1 - 2003

N2 - Quantitative etching of the polydimethylsiloxane block in a series of polystyrene-polydimethylsiloxane (PS-PDMS) block copolymers is reported. Reacting the block copolymer with anhydrous hydrogen fluoride (HF) renders a nanoporous material with the remaining PS maintaining the original morphology in the bulk. The method is very accurate for analytical determination of the PDMS content in the samples. Several morphologies (BCC, HEX and Gyroid) are conserved in the resulting glassy PS-matrix, as ascertained by small angle X-ray scattering. Especially, films of mm thickness containing secluded spherical nm wide holes of BCC symmetry are produced by this procedure.

AB - Quantitative etching of the polydimethylsiloxane block in a series of polystyrene-polydimethylsiloxane (PS-PDMS) block copolymers is reported. Reacting the block copolymer with anhydrous hydrogen fluoride (HF) renders a nanoporous material with the remaining PS maintaining the original morphology in the bulk. The method is very accurate for analytical determination of the PDMS content in the samples. Several morphologies (BCC, HEX and Gyroid) are conserved in the resulting glassy PS-matrix, as ascertained by small angle X-ray scattering. Especially, films of mm thickness containing secluded spherical nm wide holes of BCC symmetry are produced by this procedure.

M3 - Conference abstract in proceedings

BT - Book of Abstracts

T2 - Danske Krystallografmøde

Y2 - 1 January 2003

ER -