From Block Copolymers to Nano-porous Materials

Martin Etchells Vigild, Sokol Ndoni, Rolf Henrik Berg

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsResearch

Abstract

Quantitative etching of the polydimethylsiloxane block in a series of polystyrene-polydimethylsiloxane (PS-PDMS) block copolymers is reported. Reacting the block copolymer with anhydrous hydrogen fluoride (HF) renders a nanoporous material with the remaining PS maintaining the original morphology in the bulk. The method is very accurate for analytical determination of the PDMS content in the samples. Several morphologies (BCC, HEX and Gyroid) are conserved in the resulting glassy PS-matrix, as ascertained by small angle X-ray scattering. Especially, films of mm thickness containing secluded spherical nm wide holes of BCC symmetry are produced by this procedure.
Original languageEnglish
Title of host publicationBook of Abstracts
Publication date2003
Publication statusPublished - 2003
EventDanske Krystallografmøde - Copnhagen, Denmark
Duration: 1 Jan 2003 → …
Conference number: 33

Conference

ConferenceDanske Krystallografmøde
Number33
CityCopnhagen, Denmark
Period01/01/2003 → …

Fingerprint Dive into the research topics of 'From Block Copolymers to Nano-porous Materials'. Together they form a unique fingerprint.

Cite this