Abstract
The present disclosure relates to a method for formation of monolithic nanostructures on an implantable device, the method comprising: a. depositing a metal film to a surface of the implantable device; b. heating the metal film for a period of time, such that the metal film transforms into multiple discrete nanoparticles, the multiple nanoparticles thereby forming an etch mask on said surface of the implantable device; c. etching the implantable device such that said surface of the implantable device is etched through the etch mask, thereby forming monolithic nanostructures in said surface of the implantable device; and d. (optionally) removing the etch mask, such as by immersion in an aqua regia solution.
| Original language | English |
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| IPC | C23F 4/ 04 A I |
| Patent number | WO2021239877 |
| Filing date | 27/05/2020 |
| Country/Territory | International Bureau of the World Intellectual Property Organization (WIPO) |
| Priority date | 27/05/2020 |
| Priority number | EP20200176728 |
| Publication status | Published - 2 Dec 2021 |