First experimental results on CMOS Integrated Nickel Electroplated Resonators

Arda Deniz Yalcinkaya, Ole Hansen

    Research output: Contribution to journalJournal articleResearchpeer-review

    Abstract

    This paper presents experimental results on MEMS metallic add-on post-fabrication effects on complementary metal oxide semiconductor (CMOS) transistors. Two versions of add-on processing, that use either e-beam evaporation or magnetron sputtering, are compared through investigation of the electrical parameters of n-channel and p-channel transistors. The magnetron sputtering technique is shown to be compatible with standard CMOS electronics without any restriction of the metal types and annealing requirements.
    Original languageEnglish
    JournalPhysica Scripta
    VolumeT114
    Pages (from-to)184-187
    ISSN0031-8949
    DOIs
    Publication statusPublished - 2004

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