TY - JOUR
T1 - Fine structure of the atomic scattering factors near the iridium L-edges
AU - Awaki, Hisamitsu
AU - Maeda, Yoshitomo
AU - Matsumoto, Hironori
AU - Bavdaz, Marcos
AU - Christensen, Finn E.
AU - Collon, Maximilien
AU - Ferreira, Desiree D.M.
AU - Ishibashi, Kazunori
AU - Massahi, Sonny
AU - Miyazawa, Takuya
AU - Svendsen, Sara
AU - Tamura, Keisuke
N1 - Publisher Copyright:
© The Authors. Published by SPIE under a Creative Commons Attribution 4.0 International License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.
PY - 2022
Y1 - 2022
N2 - We measured the reflectivity of an Athena silicon pore optics sample coated with 10-nm thick iridium near the iridium L-edges (L3 , L2, and L1) in a step of 1.5 eV. The derived atomic scattering factor f2 was similar to a shape of the absorption coefficient μ near L3 and L2 obtained by previous x-ray absorption spectroscopy (XAS) measurements. The fine structures of f2 of L3 and L2
can be represented by a strong sharp line referred to as a white line
(WL) and two weak lines at center energies of ∼17 and ∼31 eV from each
edge energy. The branching ratio (L3 / L2) of the WL is >2, which reflects the initial core-electron states available for the L2 (2p1/2) and L3 (2p3/2) processes, and the ratio remains high to the energy of +7 . 5 eV from WL. The fine structure seen in L1 also has two weak lines, which were seen in XAS at L1-edge. Our measurements near L3, L2, and L1
edges demonstrated a different technique to provide atomic structural
information as XAS. The ground calibration to measure fine structures
near the edges may potentially be simplified using f2 estimated based on μ.
AB - We measured the reflectivity of an Athena silicon pore optics sample coated with 10-nm thick iridium near the iridium L-edges (L3 , L2, and L1) in a step of 1.5 eV. The derived atomic scattering factor f2 was similar to a shape of the absorption coefficient μ near L3 and L2 obtained by previous x-ray absorption spectroscopy (XAS) measurements. The fine structures of f2 of L3 and L2
can be represented by a strong sharp line referred to as a white line
(WL) and two weak lines at center energies of ∼17 and ∼31 eV from each
edge energy. The branching ratio (L3 / L2) of the WL is >2, which reflects the initial core-electron states available for the L2 (2p1/2) and L3 (2p3/2) processes, and the ratio remains high to the energy of +7 . 5 eV from WL. The fine structure seen in L1 also has two weak lines, which were seen in XAS at L1-edge. Our measurements near L3, L2, and L1
edges demonstrated a different technique to provide atomic structural
information as XAS. The ground calibration to measure fine structures
near the edges may potentially be simplified using f2 estimated based on μ.
KW - Atomic scattering factors
KW - Iridium
KW - X-ray absorption fine structure
KW - X-ray absorption near edge structure
U2 - 10.1117/1.JATIS.8.4.044001
DO - 10.1117/1.JATIS.8.4.044001
M3 - Journal article
AN - SCOPUS:85147505247
SN - 2329-4124
VL - 8
JO - Journal of Astronomical Telescopes, Instruments, and Systems
JF - Journal of Astronomical Telescopes, Instruments, and Systems
IS - 4
M1 - 044001
ER -