Fast‐writing E‐beam for defining large arrays of nano‐holes

Emil Højlund-Nielsen, Jeppe Sandvik Clausen, Alexander Bruun Christiansen, Tine Greibe, N. Asger Mortensen, Anders Kristensen

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Abstract

Efficient nanoscale patterning of large areas is required for sub-wavelength optics. For example, 200 nm periodic structures are often too small to be made with standard UV- and DUV-equipment. Still, the final product must be made at an economic cost. Here we use a fast-writing strategy described in [1], where electron beam lithography (EBL) with a focused Gaussian beam is used to define shapes directly. The serial technique is optimized for speed and pattern fidelity to a maximum writing speed of around 30 min/cm2 for 200 nm periods in 2D lattices. The overall costs in terms of machine time and feasibility are assessed for different topographies and dimensions.
Original languageEnglish
Title of host publicationProceedings of the 39th International Conference on Micro and Nano Engineering
Number of pages1
Publication date2013
Publication statusPublished - 2013
Event39th International Conference on Micro and Nano Engineering - London, United Kingdom
Duration: 16 Sep 201319 Sep 2013
Conference number: 39th

Conference

Conference39th International Conference on Micro and Nano Engineering
Number39th
CountryUnited Kingdom
CityLondon
Period16/09/201319/09/2013

Keywords

  • Electron Beam Lithography
  • Nanofabrication
  • Sub-wavelength
  • Optics

Cite this

Højlund-Nielsen, E., Clausen, J. S., Christiansen, A. B., Greibe, T., Mortensen, N. A., & Kristensen, A. (2013). Fast‐writing E‐beam for defining large arrays of nano‐holes. In Proceedings of the 39th International Conference on Micro and Nano Engineering