Fast thermal nanoimprint lithography by a stamp with integrated heater

Massimo Tormen, Radu Malureanu, Rasmus Haugstrup Pedersen, Lasse Vestergaard Lorenzen, Kristian Hagsted Rasmussen, Christopher James Lüscher, Anders Kristensen, Ole Hansen

Research output: Contribution to journalConference articleResearchpeer-review

Abstract

We propose fast nanoimprinting lithography (NIL) process based on the use of stamps with integrated heater. The latter consists of heavily ion implantation n-type doped silicon layer buried below the microstructured surface of the stamp. The stamp is heated by Joule effect, by 50 μs 25 Hz repetition rate current pulses flowing in the conductive layer. Using this approach we have reproducibly imprinted areas of 2 cm2 within 16 s with residual layers in the range of few tens of nm. This result paves the way for processes in the sub-1 s timescale over large area surfaces.
Original languageEnglish
JournalMicroelectronic Engineering
Volume85
Issue number5-6
Pages (from-to)1229-1232
ISSN0167-9317
DOIs
Publication statusPublished - 2008
Event33rd International Conference on Micro- and Nano-Engineering - Copenhagen, Denmark
Duration: 23 Sep 200726 Sep 2007
Conference number: 33
http://www.mne07.org/

Conference

Conference33rd International Conference on Micro- and Nano-Engineering
Number33
CountryDenmark
CityCopenhagen
Period23/09/200726/09/2007
Internet address

Keywords

  • Integrated heater
  • Stamps
  • Joule effect
  • Nanoimprint lithography

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