Fast silicon etching by plasma-sheath-lens focused negative ions

Research output: Chapter in Book/Report/Conference proceeding › Conference abstract in proceedings › Research › peer-review

Original language	English
Title of host publication	Book of Abstracts
Publication date	2009
Pages	14-16
Publication status	Published - 2009
Event	17th International Colloquium on Plasma Processes - Marseille, France Duration: 22 Jun 2009 → 26 Jun 2009 Conference number: 17

Conference	17th International Colloquium on Plasma Processes
Number	17
Country/Territory	France
City	Marseille
Period	22/06/2009 → 26/06/2009

Keywords

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title = "Fast silicon etching by plasma-sheath-lens focused negative ions",

keywords = "Plasma processing, Fusion energy, Fusionsenergi, Plasmaprocessering",

author = "Eugen Stamate",

year = "2009",

language = "English",

pages = "14--16",

booktitle = "Book of Abstracts",

note = "17th International Colloquium on Plasma Processes ; Conference date: 22-06-2009 Through 26-06-2009",

}

TY - ABST

T1 - Fast silicon etching by plasma-sheath-lens focused negative ions

AU - Stamate, Eugen

N1 - Conference code: 17

PY - 2009

Y1 - 2009

KW - Plasma processing

KW - Fusion energy

KW - Fusionsenergi

KW - Plasmaprocessering

M3 - Conference abstract in proceedings

SP - 14

EP - 16

BT - Book of Abstracts

T2 - 17th International Colloquium on Plasma Processes

Y2 - 22 June 2009 through 26 June 2009

ER -