Fast silicon etching by plasma-sheath-lens focused negative ions

Eugen Stamate (Invited author)

    Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsResearchpeer-review

    Original languageEnglish
    Title of host publicationBook of Abstracts
    Publication date2009
    Pages14-16
    Publication statusPublished - 2009
    Event17th International Colloquium on Plasma Processes - Marseille (FR)
    Duration: 1 Jan 2009 → …

    Conference

    Conference17th International Colloquium on Plasma Processes
    CityMarseille (FR)
    Period01/01/2009 → …

    Keywords

    • Plasma processing
    • Fusion energy

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