Fast silicon etching by negative ions in a matrix ECR plasma source

Research output: Contribution to conference › Conference abstract for conference › Research

Original language	English
Publication date	2010
Publication status	Published - 2010
Event	3rd Workshop on Plasma Etch and Strip in Microelectronics - Grenoble (FR), 4-5 Mar. Duration: 1 Jan 2010 → …

Conference	3rd Workshop on Plasma Etch and Strip in Microelectronics
City	Grenoble (FR), 4-5 Mar.
Period	01/01/2010 → …

Keywords

@conference{4f50cca43f444fc0b34927e0246ee1c6,

title = "Fast silicon etching by negative ions in a matrix ECR plasma source",

keywords = "Plasma processing, Fusion energy, Fusionsenergi, Plasmaprocessering",

author = "Mihai Draghici and Eugen Stamate",

year = "2010",

language = "English",

note = "3rd Workshop on Plasma Etch and Strip in Microelectronics, PESM2010 ; Conference date: 01-01-2010",

}