Fast silicon etching by negative ions in a matrix ECR plasma source

Mihai Draghici, Eugen Stamate

    Research output: Contribution to conferenceConference abstract for conferenceResearch

    Original languageEnglish
    Publication date2010
    Publication statusPublished - 2010
    Event3rd Workshop on Plasma Etch and Strip in Microelectronics - Grenoble, France
    Duration: 4 Mar 20105 Mar 2010
    Conference number: 3

    Conference

    Conference3rd Workshop on Plasma Etch and Strip in Microelectronics
    Number3
    Country/TerritoryFrance
    CityGrenoble
    Period04/03/201005/03/2010

    Keywords

    • Plasma processing
    • Fusion energy

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