Fast silicon etching by negative ions in a matrix ECR plasma source

Mihai Draghici, Eugen Stamate

    Research output: Contribution to conferenceConference abstract for conferenceResearch

    Original languageEnglish
    Publication date2010
    Publication statusPublished - 2010
    Event3rd Workshop on Plasma Etch and Strip in Microelectronics - Grenoble (FR), 4-5 Mar.
    Duration: 1 Jan 2010 → …

    Conference

    Conference3rd Workshop on Plasma Etch and Strip in Microelectronics
    CityGrenoble (FR), 4-5 Mar.
    Period01/01/2010 → …

    Keywords

    • Plasma processing
    • Fusion energy

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