Abstract
By using a spring-loaded adapter, instant heating and cooling of wafer-type substrates was implemented in standard hot embossing equipment. This was possible by using the well-known concept of a clamped stack of stamp and substrate, pre-assembled in an alignment fixture. A number of thermoplastic and thermocurable resists were molded in an isothermal process with total press occupancy of one cycle of less than 5 min. By further reducing overhead time for mounting and press closing, sub-minute imprint cycles seem possible.
| Original language | English |
|---|---|
| Journal | Microelectronic Engineering |
| Volume | 84 |
| Pages (from-to) | 932-936 |
| ISSN | 0167-9317 |
| DOIs | |
| Publication status | Published - 2007 |
Keywords
- Thermal imprint
- Alignment fixture
- Isothermal process
- Thermocuring
- Thermoplast
- Nanoimprint lithography
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