Fast and large-area fabrication of plasmonic reflection color filters by achromatic Talbot lithography

Research output: Contribution to journalJournal article – Annual report year: 2019Researchpeer-review

DOI

  • Author: Wu, Qingjun

    Zhejiang University, China

  • Author: Xia, Huijuan

    Chinese Academy of Sciences, China

  • Author: Jia, Hao

    Zhejiang University, China

  • Author: Wang, Hao

    Zhejiang University, China

  • Author: Jiang, Cheng

    Zhejiang University, China

  • Author: Wang, Liansheng

    Chinese Academy of Sciences, China

  • Author: Zhao, Jun Hua

    Chinese Academy of Sciences, China

  • Author: Tai, Renzhong

    Chinese Academy of Sciences, China

  • Author: Xiao, Sanshui

    Structured Electromagnetic Materials, Department of Photonics Engineering, Technical University of Denmark, Ørsteds Plads, 2800, Kgs. Lyngby, Denmark

  • Author: Zhang, Dongxian

    Zhejiang University, China

  • Author: Yang, Shumin

    Chinese Academy of Sciences, China

  • Author: Jiang, Jianzhong

    Zhejiang University, China

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To overcome the limits of traditional technologies, which cannot achieve high resolution and high throughput simultaneously, here we propose, to the best of our knowledge, a novel method, i.e., achromatic Talbot lithography, to fabricate large-area nanopatterns fast and precisely. We successfully demonstrate reflection color filters with a maximum size of about 0.72 × 0.72 mm 2 with a time of only 20 s that have colors similar to simulations and small-area devices fabricated by electron beam lithography. These results indicate the possibility of large-scale fabrication of plasmonic color filters with high resolution efficiently by the achromatic Talbot lithography method.

Original languageEnglish
JournalOptics Letters
Volume44
Issue number4
Pages (from-to)1031-1034
ISSN0146-9592
DOIs
Publication statusPublished - 15 Feb 2019
CitationsWeb of Science® Times Cited: No match on DOI
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