Fast and large-area fabrication of plasmonic reflection color filters by achromatic Talbot lithography

Qingjun Wu, Huijuan Xia, Hao Jia, Hao Wang, Cheng Jiang, Liansheng Wang, Jun Zhao, Renzhong Tai, Sanshui Xiao, Dongxian Zhang*, Shumin Yang, Jianzhong Jiang

*Corresponding author for this work

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Abstract

To overcome the limits of traditional technologies, which cannot achieve high resolution and high throughput simultaneously, here we propose, to the best of our knowledge, a novel method, i.e., achromatic Talbot lithography, to fabricate large-area nanopatterns fast and precisely. We successfully demonstrate reflection color filters with a maximum size of about 0.72 × 0.72 mm 2 with a time of only 20 s that have colors similar to simulations and small-area devices fabricated by electron beam lithography. These results indicate the possibility of large-scale fabrication of plasmonic color filters with high resolution efficiently by the achromatic Talbot lithography method.

Original languageEnglish
JournalOptics Letters
Volume44
Issue number4
Pages (from-to)1031-1034
ISSN0146-9592
DOIs
Publication statusPublished - 15 Feb 2019

Cite this

Wu, Qingjun ; Xia, Huijuan ; Jia, Hao ; Wang, Hao ; Jiang, Cheng ; Wang, Liansheng ; Zhao, Jun ; Tai, Renzhong ; Xiao, Sanshui ; Zhang, Dongxian ; Yang, Shumin ; Jiang, Jianzhong. / Fast and large-area fabrication of plasmonic reflection color filters by achromatic Talbot lithography. In: Optics Letters. 2019 ; Vol. 44, No. 4. pp. 1031-1034.
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title = "Fast and large-area fabrication of plasmonic reflection color filters by achromatic Talbot lithography",
abstract = "To overcome the limits of traditional technologies, which cannot achieve high resolution and high throughput simultaneously, here we propose, to the best of our knowledge, a novel method, i.e., achromatic Talbot lithography, to fabricate large-area nanopatterns fast and precisely. We successfully demonstrate reflection color filters with a maximum size of about 0.72 × 0.72 mm 2 with a time of only 20 s that have colors similar to simulations and small-area devices fabricated by electron beam lithography. These results indicate the possibility of large-scale fabrication of plasmonic color filters with high resolution efficiently by the achromatic Talbot lithography method.",
author = "Qingjun Wu and Huijuan Xia and Hao Jia and Hao Wang and Cheng Jiang and Liansheng Wang and Jun Zhao and Renzhong Tai and Sanshui Xiao and Dongxian Zhang and Shumin Yang and Jianzhong Jiang",
year = "2019",
month = "2",
day = "15",
doi = "10.1364/OL.44.001031",
language = "English",
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pages = "1031--1034",
journal = "Optics Letters",
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Wu, Q, Xia, H, Jia, H, Wang, H, Jiang, C, Wang, L, Zhao, J, Tai, R, Xiao, S, Zhang, D, Yang, S & Jiang, J 2019, 'Fast and large-area fabrication of plasmonic reflection color filters by achromatic Talbot lithography', Optics Letters, vol. 44, no. 4, pp. 1031-1034. https://doi.org/10.1364/OL.44.001031

Fast and large-area fabrication of plasmonic reflection color filters by achromatic Talbot lithography. / Wu, Qingjun; Xia, Huijuan; Jia, Hao; Wang, Hao; Jiang, Cheng; Wang, Liansheng; Zhao, Jun; Tai, Renzhong; Xiao, Sanshui; Zhang, Dongxian; Yang, Shumin; Jiang, Jianzhong.

In: Optics Letters, Vol. 44, No. 4, 15.02.2019, p. 1031-1034.

Research output: Contribution to journalJournal articleResearchpeer-review

TY - JOUR

T1 - Fast and large-area fabrication of plasmonic reflection color filters by achromatic Talbot lithography

AU - Wu, Qingjun

AU - Xia, Huijuan

AU - Jia, Hao

AU - Wang, Hao

AU - Jiang, Cheng

AU - Wang, Liansheng

AU - Zhao, Jun

AU - Tai, Renzhong

AU - Xiao, Sanshui

AU - Zhang, Dongxian

AU - Yang, Shumin

AU - Jiang, Jianzhong

PY - 2019/2/15

Y1 - 2019/2/15

N2 - To overcome the limits of traditional technologies, which cannot achieve high resolution and high throughput simultaneously, here we propose, to the best of our knowledge, a novel method, i.e., achromatic Talbot lithography, to fabricate large-area nanopatterns fast and precisely. We successfully demonstrate reflection color filters with a maximum size of about 0.72 × 0.72 mm 2 with a time of only 20 s that have colors similar to simulations and small-area devices fabricated by electron beam lithography. These results indicate the possibility of large-scale fabrication of plasmonic color filters with high resolution efficiently by the achromatic Talbot lithography method.

AB - To overcome the limits of traditional technologies, which cannot achieve high resolution and high throughput simultaneously, here we propose, to the best of our knowledge, a novel method, i.e., achromatic Talbot lithography, to fabricate large-area nanopatterns fast and precisely. We successfully demonstrate reflection color filters with a maximum size of about 0.72 × 0.72 mm 2 with a time of only 20 s that have colors similar to simulations and small-area devices fabricated by electron beam lithography. These results indicate the possibility of large-scale fabrication of plasmonic color filters with high resolution efficiently by the achromatic Talbot lithography method.

U2 - 10.1364/OL.44.001031

DO - 10.1364/OL.44.001031

M3 - Journal article

VL - 44

SP - 1031

EP - 1034

JO - Optics Letters

JF - Optics Letters

SN - 0146-9592

IS - 4

ER -