Fast and large-area fabrication of plasmonic reflection color filters by achromatic Talbot lithography

Qingjun Wu, Huijuan Xia, Hao Jia, Hao Wang, Cheng Jiang, Liansheng Wang, Jun Zhao, Renzhong Tai, Sanshui Xiao, Dongxian Zhang*, Shumin Yang, Jianzhong Jiang

*Corresponding author for this work

Research output: Contribution to journalJournal articleResearchpeer-review

130 Downloads (Pure)

Abstract

To overcome the limits of traditional technologies, which cannot achieve high resolution and high throughput simultaneously, here we propose, to the best of our knowledge, a novel method, i.e., achromatic Talbot lithography, to fabricate large-area nanopatterns fast and precisely. We successfully demonstrate reflection color filters with a maximum size of about 0.72 × 0.72 mm 2 with a time of only 20 s that have colors similar to simulations and small-area devices fabricated by electron beam lithography. These results indicate the possibility of large-scale fabrication of plasmonic color filters with high resolution efficiently by the achromatic Talbot lithography method.

Original languageEnglish
JournalOptics Letters
Volume44
Issue number4
Pages (from-to)1031-1034
ISSN0146-9592
DOIs
Publication statusPublished - 15 Feb 2019

Fingerprint

Dive into the research topics of 'Fast and large-area fabrication of plasmonic reflection color filters by achromatic Talbot lithography'. Together they form a unique fingerprint.

Cite this