Abstract
A simple and complementary metal oxide semiconductor (CMOS) compatible fabrication technique for microelectromechanical (MEMS) devices is presented. The fabrication technology makes use of electroplated metal layers. Among the fabricated devices, high quality factor microresonators are characterised with respect to the quality factor.
| Original language | English |
|---|---|
| Journal | Electronics letters |
| Volume | 38 |
| Issue number | 24 |
| Pages (from-to) | 1526-1527 |
| ISSN | 0013-5194 |
| Publication status | Published - 2002 |
Cite this
Yalcinkaya, A. D., Ravnkilde, J. T., & Hansen, O. (2002). Fabrication of integrated metallic MEMS devices. Electronics letters, 38(24), 1526-1527.