Fabrication of integrated metallic MEMS devices

Arda Deniz Yalcinkaya, Jan Tue Ravnkilde, Ole Hansen

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    A simple and complementary metal oxide semiconductor (CMOS) compatible fabrication technique for microelectromechanical (MEMS) devices is presented. The fabrication technology makes use of electroplated metal layers. Among the fabricated devices, high quality factor microresonators are characterised with respect to the quality factor.
    Original languageEnglish
    JournalElectronics letters
    Issue number24
    Pages (from-to)1526-1527
    Publication statusPublished - 2002

    Cite this

    Yalcinkaya, A. D., Ravnkilde, J. T., & Hansen, O. (2002). Fabrication of integrated metallic MEMS devices. Electronics letters, 38(24), 1526-1527.