Fabrication of integrated metallic MEMS devices

Arda Deniz Yalcinkaya; Jan Tue Ravnkilde; Ole Hansen

Fabrication of integrated metallic MEMS devices

Arda Deniz Yalcinkaya, Jan Tue Ravnkilde, Ole Hansen

Research output: Contribution to journal › Journal article › Research › peer-review

Abstract

A simple and complementary metal oxide semiconductor (CMOS) compatible fabrication technique for microelectromechanical (MEMS) devices is presented. The fabrication technology makes use of electroplated metal layers. Among the fabricated devices, high quality factor microresonators are characterised with respect to the quality factor.

Original language	English
Journal	Electronics Letters
Volume	38
Issue number	24
Pages (from-to)	1526-1527
ISSN	0013-5194
Publication status	Published - 2002

OpenUrl availability

Full text

Cite this

@article{ab5b8c8f58e14ef29098155e8e050a04,

title = "Fabrication of integrated metallic MEMS devices",

abstract = "A simple and complementary metal oxide semiconductor (CMOS) compatible fabrication technique for microelectromechanical (MEMS) devices is presented. The fabrication technology makes use of electroplated metal layers. Among the fabricated devices, high quality factor microresonators are characterised with respect to the quality factor.",

author = "Yalcinkaya, {Arda Deniz} and Ravnkilde, {Jan Tue} and Ole Hansen",

year = "2002",

language = "English",

volume = "38",

pages = "1526--1527",

journal = "Electronics Letters",

issn = "0013-5194",

publisher = "John Wiley & Sons Inc.",

number = "24",

}

TY - JOUR

T1 - Fabrication of integrated metallic MEMS devices

AU - Yalcinkaya, Arda Deniz

AU - Ravnkilde, Jan Tue

AU - Hansen, Ole

PY - 2002

Y1 - 2002

N2 - A simple and complementary metal oxide semiconductor (CMOS) compatible fabrication technique for microelectromechanical (MEMS) devices is presented. The fabrication technology makes use of electroplated metal layers. Among the fabricated devices, high quality factor microresonators are characterised with respect to the quality factor.

AB - A simple and complementary metal oxide semiconductor (CMOS) compatible fabrication technique for microelectromechanical (MEMS) devices is presented. The fabrication technology makes use of electroplated metal layers. Among the fabricated devices, high quality factor microresonators are characterised with respect to the quality factor.

M3 - Journal article

SN - 0013-5194

VL - 38

SP - 1526

EP - 1527

JO - Electronics Letters

JF - Electronics Letters

IS - 24

ER -

Fabrication of integrated metallic MEMS devices

Abstract

OpenUrl availability

Fingerprint

Cite this