Fabrication of integrated metallic MEMS devices

Arda Deniz Yalcinkaya, Jan Tue Ravnkilde, Ole Hansen

    Research output: Contribution to journalJournal articleResearchpeer-review

    Abstract

    A simple and complementary metal oxide semiconductor (CMOS) compatible fabrication technique for microelectromechanical (MEMS) devices is presented. The fabrication technology makes use of electroplated metal layers. Among the fabricated devices, high quality factor microresonators are characterised with respect to the quality factor.
    Original languageEnglish
    JournalElectronics letters
    Volume38
    Issue number24
    Pages (from-to)1526-1527
    ISSN0013-5194
    Publication statusPublished - 2002

    Cite this

    Yalcinkaya, A. D., Ravnkilde, J. T., & Hansen, O. (2002). Fabrication of integrated metallic MEMS devices. Electronics letters, 38(24), 1526-1527.
    Yalcinkaya, Arda Deniz ; Ravnkilde, Jan Tue ; Hansen, Ole. / Fabrication of integrated metallic MEMS devices. In: Electronics letters. 2002 ; Vol. 38, No. 24. pp. 1526-1527.
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    title = "Fabrication of integrated metallic MEMS devices",
    abstract = "A simple and complementary metal oxide semiconductor (CMOS) compatible fabrication technique for microelectromechanical (MEMS) devices is presented. The fabrication technology makes use of electroplated metal layers. Among the fabricated devices, high quality factor microresonators are characterised with respect to the quality factor.",
    author = "Yalcinkaya, {Arda Deniz} and Ravnkilde, {Jan Tue} and Ole Hansen",
    year = "2002",
    language = "English",
    volume = "38",
    pages = "1526--1527",
    journal = "Electronics Letters",
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    Yalcinkaya, AD, Ravnkilde, JT & Hansen, O 2002, 'Fabrication of integrated metallic MEMS devices', Electronics letters, vol. 38, no. 24, pp. 1526-1527.

    Fabrication of integrated metallic MEMS devices. / Yalcinkaya, Arda Deniz; Ravnkilde, Jan Tue; Hansen, Ole.

    In: Electronics letters, Vol. 38, No. 24, 2002, p. 1526-1527.

    Research output: Contribution to journalJournal articleResearchpeer-review

    TY - JOUR

    T1 - Fabrication of integrated metallic MEMS devices

    AU - Yalcinkaya, Arda Deniz

    AU - Ravnkilde, Jan Tue

    AU - Hansen, Ole

    PY - 2002

    Y1 - 2002

    N2 - A simple and complementary metal oxide semiconductor (CMOS) compatible fabrication technique for microelectromechanical (MEMS) devices is presented. The fabrication technology makes use of electroplated metal layers. Among the fabricated devices, high quality factor microresonators are characterised with respect to the quality factor.

    AB - A simple and complementary metal oxide semiconductor (CMOS) compatible fabrication technique for microelectromechanical (MEMS) devices is presented. The fabrication technology makes use of electroplated metal layers. Among the fabricated devices, high quality factor microresonators are characterised with respect to the quality factor.

    M3 - Journal article

    VL - 38

    SP - 1526

    EP - 1527

    JO - Electronics Letters

    JF - Electronics Letters

    SN - 0013-5194

    IS - 24

    ER -

    Yalcinkaya AD, Ravnkilde JT, Hansen O. Fabrication of integrated metallic MEMS devices. Electronics letters. 2002;38(24):1526-1527.