Fabrication of high-Q, high-confinement 4H-SiC microring resonators by surface roughness reduction

Yi Zheng, Minhao Pu, Ailun Yi, Ayman Nassar Kamel, Martin Romme Henriksen, Asbjørn A. Jørgensen, Xin Ou, Haiyan Ou

Research output: Chapter in Book/Report/Conference proceedingArticle in proceedingsResearchpeer-review

Abstract

We improve the Q of SiC microring resonators with a sub-micron cross-sectional dimension by a factor of six by reducing surface roughness. We achieve a high Q (~73,000) for such a device with anomalous dispersion.

Original languageEnglish
Title of host publicationCLEO: Science and Innovations 2019
PublisherIEEE
Publication date2019
Article numberPaper SM2O.7
ISBN (Print)978-1-943580-57-6
DOIs
Publication statusPublished - 2019
Event2019 CLEO Conference & Exhibition - San Jose Convention Center, San Jose, United States
Duration: 5 May 201910 May 2019
Conference number: 39
https://www.cleoconference.org/home/

Conference

Conference2019 CLEO Conference & Exhibition
Number39
LocationSan Jose Convention Center
CountryUnited States
CitySan Jose
Period05/05/201910/05/2019
SponsorAdValue Photonics Inc, American Elements, Class5 Photonics, Coherent Inc., Go!Foton, American Physical Society, IEEE, The Optical Society
Internet address

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