Fabrication of high-Q, high-confinement 4H-SiC microring resonators by surface roughness reduction

Yi Zheng, Minhao Pu, Ailun Yi, Ayman Nassar Kamel, Martin Romme Henriksen, Asbjørn A. Jørgensen, Xin Ou, Haiyan Ou

Research output: Chapter in Book/Report/Conference proceedingArticle in proceedingsResearchpeer-review


We improve the Q of SiC microring resonators with a sub-micron cross-sectional dimension by a factor of six by reducing surface roughness. We achieve a high Q (~73,000) for such a device with anomalous dispersion.

Original languageEnglish
Title of host publicationCLEO: Science and Innovations 2019
Publication date2019
Article numberPaper SM2O.7
ISBN (Print)978-1-943580-57-6
Publication statusPublished - 2019
Event2019 CLEO Conference & Exhibition - San Jose Convention Center, San Jose, United States
Duration: 5 May 201910 May 2019
Conference number: 39


Conference2019 CLEO Conference & Exhibition
LocationSan Jose Convention Center
Country/TerritoryUnited States
CitySan Jose
SponsorAdValue Photonics Inc, American Elements, Class5 Photonics, Coherent Inc., Go!Foton, American Physical Society, IEEE, The Optical Society
Internet address


Dive into the research topics of 'Fabrication of high-Q, high-confinement 4H-SiC microring resonators by surface roughness reduction'. Together they form a unique fingerprint.

Cite this