Fabrication of high-Q, high-confinement 4H-SiC microring resonators by surface roughness reduction

Yi Zheng, Minhao Pu, Ailun Yi, Ayman Nassar Kamel, Martin Romme Henriksen, Asbjørn A. Jørgensen, Xin Ou, Haiyan Ou

Research output: Chapter in Book/Report/Conference proceedingArticle in proceedingsResearchpeer-review

Abstract

We improve the Q of SiC microring resonators with a sub-micron cross-sectional dimension by a factor of six by reducing surface roughness. We achieve a high Q (~73,000) for such a device with anomalous dispersion.

Original languageEnglish
Title of host publicationCLEO: Science and Innovations 2019
PublisherOptical Society of America
Publication date2019
Article numberPaper SM2O.7
ISBN (Print)978-1-943580-57-6
DOIs
Publication statusPublished - 2019
Event2019 CLEO Conference & Exhibition - San Jose Convention Center, San Jose, United States
Duration: 5 May 201910 May 2019
Conference number: 39
https://www.cleoconference.org/home/

Conference

Conference2019 CLEO Conference & Exhibition
Number39
LocationSan Jose Convention Center
CountryUnited States
CitySan Jose
Period05/05/201910/05/2019
SponsorAdValue Photonics Inc, American Elements, Class5 Photonics, Coherent Inc., Go!Foton, American Physical Society, IEEE, The Optical Society
Internet address

Cite this

Zheng, Y., Pu, M., Yi, A., Kamel, A. N., Henriksen, M. R., Jørgensen, A. A., ... Ou, H. (2019). Fabrication of high-Q, high-confinement 4H-SiC microring resonators by surface roughness reduction. In CLEO: Science and Innovations 2019 [Paper SM2O.7] Optical Society of America. https://doi.org/10.1364/CLEO_SI.2019.SM2O.7