Fabrication of deep-profile Al-doped ZnO one- and two-dimensional lattices as plasmonic elements

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In this work, we report on fabrication of deep-profile one- and two-dimensional lattices made from Al-doped ZnO (AZO). AZO is considered as an alternative plasmonic material having the real part of the permittivity negative in the near infrared range. The exact position of the plasma frequency of AZO is doping concentration dependent, allowing for tuning possibilities. In addition, the thickness of the AZO film also affects its material properties. Physical vapor deposition techniques typically applied for AZO coating do not enable deep profiling of a plasmonic structure. Using the atomic layer deposition technique, a highly conformal deposition method, allows us to fabricate high-aspect ratio structures such as one-dimensional lattices with a period of 400 nm and size of the lamina of 200 nm in width and 3 µm
in depth. Thus, our structures have an aspect ratio of 1:15 and are homogeneous on areas of 2x2 cm2 and more. We also produce two-dimensional arrays of circular nanopillars with similar dimensions. Instead of nanopillars hollow tubes with a wall thickness on demand from 20 nm up to a complete fill can be fabricated.
Original languageEnglish
Title of host publicationProceedings of SPIE
Number of pages7
Volume9921
PublisherSPIE - International Society for Optical Engineering
Publication date2016
Article number99210J
DOIs
Publication statusPublished - 2016
EventDesign, Materials, Fabrication, Characterization, and Applications XIV - San Diego Convention Center, San Diego, California, United States
Duration: 28 Aug 20161 Sep 2016

Conference

ConferenceDesign, Materials, Fabrication, Characterization, and Applications XIV
LocationSan Diego Convention Center
CountryUnited States
CitySan Diego, California
Period28/08/201601/09/2016
CitationsWeb of Science® Times Cited: No match on DOI

    Research areas

  • AZO, Plasmonic material, High aspect ratio lattices, Surface waves, Atomic layer deposition
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