Fabrication of channel and wedge plasmon polariton devices by combined UV and nanoimprint lithography

R.N. Nielsen; Alexandra Boltasseva; Anders Kristensen; S.I. Bozhevolnyi; V. Volkov; I. Fernandez-Cuesta; A. Klukowska

Fabrication of channel and wedge plasmon polariton devices by combined UV and nanoimprint lithography

R.N. Nielsen, Alexandra Boltasseva, Anders Kristensen, S.I. Bozhevolnyi, V. Volkov, I. Fernandez-Cuesta, A. Klukowska

Research output: Chapter in Book/Report/Conference proceeding › Article in proceedings › Research › peer-review

Original language	English
Title of host publication	CLEO/QELS 2008
Place of Publication	San Jose, CA, USA
Publisher	IEEE
Publication date	2008
Pages	QWA6
ISBN (Print)	15-57-52859-4
Publication status	Published - 2008
Event	Conference on Quantum Electronics and Laser Science Conference on Lasers and Electro-Optics 2008 - San Jose, CA, United States Duration: 4 May 2008 → 9 May 2008

Conference

Conference	Conference on Quantum Electronics and Laser Science Conference on Lasers and Electro-Optics 2008
Country	United States
City	San Jose, CA
Period	04/05/2008 → 09/05/2008

Cite this

@inproceedings{d04ac55e19994389a8a3fa52537b8b59,

title = "Fabrication of channel and wedge plasmon polariton devices by combined UV and nanoimprint lithography",

author = "R.N. Nielsen and Alexandra Boltasseva and Anders Kristensen and S.I. Bozhevolnyi and V. Volkov and I. Fernandez-Cuesta and A. Klukowska",

year = "2008",

language = "English",

isbn = "15-57-52859-4",

pages = "QWA6",

booktitle = "CLEO/QELS 2008",

publisher = "IEEE",

address = "United States",

note = "Conference on Quantum Electronics and Laser Science Conference on Lasers and Electro-Optics 2008, CLEO/QELS ; Conference date: 04-05-2008 Through 09-05-2008",

}

Nielsen, RN, Boltasseva, A, Kristensen, A, Bozhevolnyi, SI, Volkov, V, Fernandez-Cuesta, I & Klukowska, A 2008, Fabrication of channel and wedge plasmon polariton devices by combined UV and nanoimprint lithography. in CLEO/QELS 2008. IEEE, San Jose, CA, USA, pp. QWA6, Conference on Quantum Electronics and Laser Science Conference on Lasers and Electro-Optics 2008, San Jose, CA, United States, 04/05/2008.

Fabrication of channel and wedge plasmon polariton devices by combined UV and nanoimprint lithography. / Nielsen, R.N.; Boltasseva, Alexandra; Kristensen, Anders; Bozhevolnyi, S.I.; Volkov, V.; Fernandez-Cuesta, I.; Klukowska, A.

CLEO/QELS 2008. San Jose, CA, USA : IEEE, 2008. p. QWA6.

Research output: Chapter in Book/Report/Conference proceeding › Article in proceedings › Research › peer-review

TY - GEN

T1 - Fabrication of channel and wedge plasmon polariton devices by combined UV and nanoimprint lithography

AU - Nielsen, R.N.

AU - Boltasseva, Alexandra

AU - Kristensen, Anders

AU - Bozhevolnyi, S.I.

AU - Volkov, V.

AU - Fernandez-Cuesta, I.

AU - Klukowska, A.

PY - 2008

Y1 - 2008

M3 - Article in proceedings

SN - 15-57-52859-4

SP - QWA6

BT - CLEO/QELS 2008

PB - IEEE

CY - San Jose, CA, USA

T2 - Conference on Quantum Electronics and Laser Science Conference on Lasers and Electro-Optics 2008

Y2 - 4 May 2008 through 9 May 2008

ER -