Fabrication of beam homogenizers in quartz by laser micromachining

G Kopitkovas, T Lippert, Christin David, Stela Canulescu, A Wokaun, J Gobrecht

Research output: Contribution to journalJournal articleResearchpeer-review

Abstract

The combination of gray tone phase masks with a laser-based wet etching process can be applied as a one step micromachining process. This technique utilizes a XeCl excimer laser and an absorbing liquid which is in contact with quartz. Microstructures with continuous profiles, such as piano-convex microlenses in quartz, can be created with laser fluence well below the damage threshold of quartz. The roughness of the etched features varies from several micrometers to below 10 nm, depending on the laser fluence and applied absorbing solution. The etch rates of quartz using different organic solutions such as pyrene in acetone or pyrene in tetrahydrofurane reveal a complex behavior, suggesting that several processes dominate at various laser fluences. (C) 2004 Elsevier B.V. All rights reserved.
Original languageEnglish
JournalJournal of Photochemistry and Photobiology, A: Chemistry
Volume166
Issue number1-3
Pages (from-to)135-140
ISSN1010-6030
DOIs
Publication statusPublished - 2004
Externally publishedYes

Keywords

  • RANDOM-PHASE PLATE
  • FUSED-SILICA
  • MULTIPHOTONIC ABSORPTION
  • TRANSPARENT MATERIALS
  • OPTICAL-ELEMENTS
  • EXCIMER-LASER
  • ABLATION
  • MICROFABRICATION
  • GLASS
  • wet etching
  • microlens
  • homogenizer
  • quartz
  • laser ablation
  • Bioengineering
  • Physical and Theoretical Chemistry
  • Homogenizer
  • Laser ablation
  • Microlens
  • Quartz
  • Wet etching
  • acetone
  • chlorine
  • pyrene
  • tetrahydrofuran
  • xenon
  • absorption
  • article
  • chemical procedures
  • chemical structure
  • controlled study
  • excimer laser
  • lens
  • low temperature procedures
  • surface property

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