Fabrication and surface passivation of porous 6H-SiC by atomic layer deposited films

Engineering

• Atomic Layer 66%
• Thickness 66%
• Fabrication 33%
• Passivation 33%
• Enhancement 33%
• Anisotropic 33%
• Scanning Electron Microscope 33%
• Deposited Film 33%
• Broadening 33%
• Etching Process 33%
• Energy Gap 33%
• Acid 33%
• Images 33%

Physics

• Photoluminescence 100%
• Etching 100%
• Porosity 33%
• Luminescence 33%
• Passivity 33%
• Fabrication 33%
• Images 33%
• Crystals 33%
• Spectra 33%

Material Science

• Etching 100%
• Surface Passivation 100%
• Titanium Dioxide 66%
• Al2O3 33%
• Liquid Films 33%
• Crystal 33%