Fabrication and characterization of truly 3-D diffuser/nozzle                microstructures in silicon

Matthias Heschel; Matthias Müllenborn; Siebe Bouwstra

doi:10.1109/84.557529

Fabrication and characterization of truly 3-D diffuser/nozzle microstructures in silicon

Matthias Heschel, Matthias Müllenborn, Siebe Bouwstra

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Abstract

We present microfabrication and characterization of truly three-dimensional (3-D) diffuser/nozzle structures in silicon. Chemical vapor deposition (CVD), reactive ion etching (RIE), and laser-assisted etching are used to etch flow chambers and diffuser/nozzle elements. The flow behavior of the fabricated elements and the dependence of diffuser/nozzle efficiency on structure geometry has been investigated. The large freedom of 3-D micromachining combined with rapid prototyping allows one to characterize and optimize diffuser/nozzle structures

Original language	English
Journal	I E E E Journal of Microelectromechanical Systems
Volume	6
Pages (from-to)	41-47
ISSN	1057-7157
DOIs	https://doi.org/10.1109/84.557529
Publication status	Published - 1997

Bibliographical note

Copyright: 1997 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE

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title = "Fabrication and characterization of truly 3-D diffuser/nozzle microstructures in silicon",

abstract = "We present microfabrication and characterization of truly three-dimensional (3-D) diffuser/nozzle structures in silicon. Chemical vapor deposition (CVD), reactive ion etching (RIE), and laser-assisted etching are used to etch flow chambers and diffuser/nozzle elements. The flow behavior of the fabricated elements and the dependence of diffuser/nozzle efficiency on structure geometry has been investigated. The large freedom of 3-D micromachining combined with rapid prototyping allows one to characterize and optimize diffuser/nozzle structures",

author = "Matthias Heschel and Matthias M{\"u}llenborn and Siebe Bouwstra",

note = "Copyright: 1997 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE",

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AU - Müllenborn, Matthias

AU - Bouwstra, Siebe

N1 - Copyright: 1997 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE

PY - 1997

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N2 - We present microfabrication and characterization of truly three-dimensional (3-D) diffuser/nozzle structures in silicon. Chemical vapor deposition (CVD), reactive ion etching (RIE), and laser-assisted etching are used to etch flow chambers and diffuser/nozzle elements. The flow behavior of the fabricated elements and the dependence of diffuser/nozzle efficiency on structure geometry has been investigated. The large freedom of 3-D micromachining combined with rapid prototyping allows one to characterize and optimize diffuser/nozzle structures

AB - We present microfabrication and characterization of truly three-dimensional (3-D) diffuser/nozzle structures in silicon. Chemical vapor deposition (CVD), reactive ion etching (RIE), and laser-assisted etching are used to etch flow chambers and diffuser/nozzle elements. The flow behavior of the fabricated elements and the dependence of diffuser/nozzle efficiency on structure geometry has been investigated. The large freedom of 3-D micromachining combined with rapid prototyping allows one to characterize and optimize diffuser/nozzle structures

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DO - 10.1109/84.557529

M3 - Journal article

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JO - I E E E Journal of Microelectromechanical Systems

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