Fabrication and characterization of truly 3-D diffuser/nozzle microstructures in silicon

Matthias Heschel, Matthias Müllenborn, Siebe Bouwstra

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    Abstract

    We present microfabrication and characterization of truly three-dimensional (3-D) diffuser/nozzle structures in silicon. Chemical vapor deposition (CVD), reactive ion etching (RIE), and laser-assisted etching are used to etch flow chambers and diffuser/nozzle elements. The flow behavior of the fabricated elements and the dependence of diffuser/nozzle efficiency on structure geometry has been investigated. The large freedom of 3-D micromachining combined with rapid prototyping allows one to characterize and optimize diffuser/nozzle structures
    Original languageEnglish
    JournalI E E E Journal of Microelectromechanical Systems
    Volume6
    Pages (from-to)41-47
    ISSN1057-7157
    DOIs
    Publication statusPublished - 1997

    Bibliographical note

    Copyright: 1997 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE

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