Fabrication and characterization of truly 3-D diffuser/nozzle microstructures in silicon

Matthias Heschel, Matthias Müllenborn, Siebe Bouwstra

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    We present microfabrication and characterization of truly three-dimensional (3-D) diffuser/nozzle structures in silicon. Chemical vapor deposition (CVD), reactive ion etching (RIE), and laser-assisted etching are used to etch flow chambers and diffuser/nozzle elements. The flow behavior of the fabricated elements and the dependence of diffuser/nozzle efficiency on structure geometry has been investigated. The large freedom of 3-D micromachining combined with rapid prototyping allows one to characterize and optimize diffuser/nozzle structures
    Original languageEnglish
    JournalI E E E Journal of Microelectromechanical Systems
    Pages (from-to)41-47
    Publication statusPublished - 1997

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