Fabrication activity for nanophotonics

Radu Malureanu, Il-Sug Chung, Luca Carletti, Andrey Novitsky, A. Sandru, Andrei Lavrinenko

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Abstract

We present the fabrication and characterization of new structures and materials to be used in nanophotonics. The first structure presented is a fractal metallic metasurface designed to be used as a high-sensitivity sensor for 810nm wavelength. A second structure is a high index contrast grating designed for phase and amplitude control of the transmitted beam. By controlling the Au percentage in a Si matrix, one may be able to obtain high refractive index with very limited loss.
Original languageEnglish
Publication date2012
Number of pages2
Publication statusPublished - 2012
EventAES 2012 Advanced Electromagnetics Symposium - Paris, France
Duration: 16 Apr 201219 Apr 2012

Conference

ConferenceAES 2012 Advanced Electromagnetics Symposium
Country/TerritoryFrance
CityParis
Period16/04/201219/04/2012

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