Extreme UV and X-ray scattering measurements from a rough LiF crystal surface characterized by electron micrography

Alehyane, Arbaoui, Barchewitz, Andre, Finn Erland Christensen, Allan Hornstrup, Palmari, Rasigni, Rivoira, Rasigni

Research output: Contribution to journalJournal articleResearchpeer-review

Abstract

XUV and X-ray scattering by a LiF crystal is measured. The angular distribution of the scattered radiation (ADSR) reveals characteristic features, side peaks or asymmetry. The surface of the sample is statistically characterized by a microdensitometer analysis of electron micrographs resolving the short spatial wavelengths of the surface roughness. This analysis shows that the surface has a large microroughness with an autocovariance function which is Gaussian in its initial portion. The first-order perturbation vector theory of the roughness-induced scattering leads to an interpretation of the ADSR features in terms of the modulation of the surface power spectral density function associated with the microroughness by an optical factor. The possibility of obtaining short scale roughness characterization from XUV or X-ray measurements is discussed
Original languageEnglish
JournalApplied Optics
Volume28
Issue number10
Pages (from-to)1763-1772
ISSN1559-128X
DOIs
Publication statusPublished - 1989

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