Experimental demonstration of titanium nitride plasmonic interconnects

N. Kinsey, M. Ferrera, G. V. Naik, Viktoriia Babicheva, V. M. Shalaev, Alexandra Boltasseva

Research output: Contribution to journalJournal articleResearchpeer-review

382 Downloads (Pure)

Abstract

An insulator-metal-insulator plasmonic interconnect using TiN, a CMOS-compatible material, is proposed and investigated experimentally at the telecommunication wavelength of 1.55 mu m. The TiN waveguide was shown to obtain propagation losses less than 0.8 dB/mm with a mode size of 9.8 mu m on sapphire, which agree well with theoretical predictions. A theoretical analysis of a solid-state structure using Si3N4 superstrates and ultra-thin metal strips shows that propagation losses less than 0.3 dB/mm with a mode size of 9 mu m are attainable. This work illustrates the potential of TiN as a realistic plasmonic material for practical solid-state, integrated nano-optic and hybrid photonic devices. (C) 2014 Optical Society of America
Original languageEnglish
JournalOptics Express
Volume22
Issue number10
Pages (from-to)12238-12247
ISSN1094-4087
DOIs
Publication statusPublished - 2014

Keywords

  • OPTICS
  • POLARITON WAVE-GUIDES
  • TELECOMMUNICATION WAVELENGTHS
  • DIELECTRIC FUNCTION
  • POLYMER
  • PROPAGATION
  • EXCITATION
  • DEPOSITION
  • COMPONENTS
  • MODULATOR
  • SILVER

Cite this

Kinsey, N., Ferrera, M., Naik, G. V., Babicheva, V., Shalaev, V. M., & Boltasseva, A. (2014). Experimental demonstration of titanium nitride plasmonic interconnects. Optics Express, 22(10), 12238-12247. https://doi.org/10.1364/OE.22.012238