Evaluation of plasma sheath thickness in reactive plasmas by discrete ion-focusing effect (poster presentation)

Research output: Chapter in Book/Report/Conference proceeding › Conference abstract in proceedings › Research

Original language	English
Title of host publication	IC-Plants 2010
Number of pages	32
Publisher	Plasma Nanotechnology Research Center
Publication date	2010
Pages	P-32
Publication status	Published - 2010
Event	3rd International Conference on Plasma-Nanotechnology and Science - Nagoya, Japan Duration: 11 Mar 2010 → 12 Mar 2010 Conference number: 3

Conference	3rd International Conference on Plasma-Nanotechnology and Science
Number	3
Country/Territory	Japan
City	Nagoya
Period	11/03/2010 → 12/03/2010

Keywords

@inbook{bb12869f3a624959b3a7fcd0b9aa12a1,

title = "Evaluation of plasma sheath thickness in reactive plasmas by discrete ion-focusing effect (poster presentation)",

keywords = "Plasma processing, Fusion energy, Fusionsenergi, Plasmaprocessering",

author = "Eugen Stamate and Mihai Draghici",

year = "2010",

language = "English",

pages = "P--32",

booktitle = "IC-Plants 2010",

publisher = "Plasma Nanotechnology Research Center",

note = "3rd International Conference on Plasma-Nanotechnology and Science, IC-PLANTS 2010 ; Conference date: 11-03-2010 Through 12-03-2010",

}

TY - ABST

T1 - Evaluation of plasma sheath thickness in reactive plasmas by discrete ion-focusing effect (poster presentation)

AU - Stamate, Eugen

AU - Draghici, Mihai

N1 - Conference code: 3

PY - 2010

Y1 - 2010

KW - Plasma processing

KW - Fusion energy

KW - Fusionsenergi

KW - Plasmaprocessering

M3 - Conference abstract in proceedings

SP - P-32

BT - IC-Plants 2010

PB - Plasma Nanotechnology Research Center

T2 - 3rd International Conference on Plasma-Nanotechnology and Science

Y2 - 11 March 2010 through 12 March 2010

ER -