Evaluation of plasma sheath thickness in reactive plasmas by discrete ion-focusing effect (poster presentation)

Research output: Chapter in Book/Report/Conference proceeding › Conference abstract in proceedings › Research

Original language	English
Title of host publication	IC-Plants 2010
Number of pages	32
Publisher	Plasma Nanotechnology Research Center
Publication date	2010
Pages	P-32
Publication status	Published - 2010
Event	3rd International conference on plasma-nanotechnology and science - Nagoya (JP), 11-12 Mar. Duration: 1 Jan 2010 → …

Conference	3rd International conference on plasma-nanotechnology and science
City	Nagoya (JP), 11-12 Mar.
Period	01/01/2010 → …

Keywords

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title = "Evaluation of plasma sheath thickness in reactive plasmas by discrete ion-focusing effect (poster presentation)",

keywords = "Plasma processing, Fusion energy, Fusionsenergi, Plasmaprocessering",

author = "Eugen Stamate and Mihai Draghici",

year = "2010",

language = "English",

pages = "P--32",

booktitle = "IC-Plants 2010",

publisher = "Plasma Nanotechnology Research Center",

note = "3rd International conference on plasma-nanotechnology and science, IC-PLANTS 2010 ; Conference date: 01-01-2010",

}

TY - ABST

T1 - Evaluation of plasma sheath thickness in reactive plasmas by discrete ion-focusing effect (poster presentation)

AU - Stamate, Eugen

AU - Draghici, Mihai

PY - 2010

Y1 - 2010

KW - Plasma processing

KW - Fusion energy

KW - Fusionsenergi

KW - Plasmaprocessering

M3 - Conference abstract in proceedings

SP - P-32

BT - IC-Plants 2010

PB - Plasma Nanotechnology Research Center

T2 - 3rd International conference on plasma-nanotechnology and science

Y2 - 1 January 2010

ER -