Abstract
Indium arsenide nanowires are grown directly on silicon substrates (see figure and cover) using a method employing self-assembled organic coatings to create oxide-based growth templates. High-performance materials, such as InAs, could have great impact on future nanoelectronics if integrated with Si, but integration has so far been hard to realize with other methods.
| Original language | English |
|---|---|
| Journal | Advanced Materials |
| Volume | 19 |
| Issue number | 14 |
| Pages (from-to) | 1801-1806 |
| Number of pages | 6 |
| ISSN | 0935-9648 |
| DOIs | |
| Publication status | Published - 2007 |
| Externally published | Yes |