Abstract
Indium arsenide nanowires are grown directly on silicon substrates (see figure and cover) using a method employing self-assembled organic coatings to create oxide-based growth templates. High-performance materials, such as InAs, could have great impact on future nanoelectronics if integrated with Si, but integration has so far been hard to realize with other methods.
Original language | English |
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Journal | Advanced Materials |
Volume | 19 |
Issue number | 14 |
Pages (from-to) | 1801-1806 |
Number of pages | 6 |
ISSN | 0935-9648 |
DOIs | |
Publication status | Published - 2007 |
Externally published | Yes |