Engineering sidewall angles of silica-on-silicon waveguides

Research output: Contribution to journalJournal articlepeer-review


Burned photoresist is used as etch mask when producing silica-onsilicon waveguides. The sidewall angle of the optical glass waveguides is engineered by varying photoresist thickness and etch selectivity. The principle for the formation of the angles is introduced and very promising experimental results are shown.
Original languageEnglish
JournalElectronics Letters
Issue number1
Pages (from-to)27-29
Publication statusPublished - 2004


Dive into the research topics of 'Engineering sidewall angles of silica-on-silicon waveguides'. Together they form a unique fingerprint.

Cite this