Energy enhancer for mask based laser materials processing

Jens Bastue; Flemmming Ove Olsen

Energy enhancer for mask based laser materials processing

Jens Bastue, Flemmming Ove Olsen

Research output: Chapter in Book/Report/Conference proceeding › Article in proceedings › Research › peer-review

Abstract

A device capable of drastically improving the energy efficiency of present mask based laser materials processing systems is presented. Good accordance between experiments and simulations for a TEA-CO2 laser system designed for laser marking has been demonstrated. The energy efficiency may be improved with a factor of 2 - 4 for typical mask transmittances between 10 - 40%.

Original language	English
Title of host publication	XI International Symposium GCL/HPL '96
Publication date	1996
Publication status	Published - 1996
Event	XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference - Heriot-Watt University, Edinburgh, United Kingdom Duration: 25 Aug 1996 → 30 Aug 1996

Conference

Conference	XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference
Location	Heriot-Watt University
Country/Territory	United Kingdom
City	Edinburgh
Period	25/08/1996 → 30/08/1996

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Cite this

@inproceedings{7a3ac9c355c740b68c69f3d755c0ac81,

title = "Energy enhancer for mask based laser materials processing",

abstract = "A device capable of drastically improving the energy efficiency of present mask based laser materials processing systems is presented. Good accordance between experiments and simulations for a TEA-CO2 laser system designed for laser marking has been demonstrated. The energy efficiency may be improved with a factor of 2 - 4 for typical mask transmittances between 10 - 40%.",

author = "Jens Bastue and Olsen, {Flemmming Ove}",

year = "1996",

language = "English",

booktitle = "XI International Symposium GCL/HPL '96",

note = "XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, GCL/HPL'96 ; Conference date: 25-08-1996 Through 30-08-1996",

}

TY - GEN

T1 - Energy enhancer for mask based laser materials processing

AU - Bastue, Jens

AU - Olsen, Flemmming Ove

PY - 1996

Y1 - 1996

N2 - A device capable of drastically improving the energy efficiency of present mask based laser materials processing systems is presented. Good accordance between experiments and simulations for a TEA-CO2 laser system designed for laser marking has been demonstrated. The energy efficiency may be improved with a factor of 2 - 4 for typical mask transmittances between 10 - 40%.

AB - A device capable of drastically improving the energy efficiency of present mask based laser materials processing systems is presented. Good accordance between experiments and simulations for a TEA-CO2 laser system designed for laser marking has been demonstrated. The energy efficiency may be improved with a factor of 2 - 4 for typical mask transmittances between 10 - 40%.

M3 - Article in proceedings

BT - XI International Symposium GCL/HPL '96

T2 - XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference

Y2 - 25 August 1996 through 30 August 1996

ER -