Results of electrosynthesis of tantalum borides in fluoride and oxyfluoride melts are compared. It is shown that the single-phase X-ray-amorphous micro-layered coatings form only in the latter case. Linear and square-wave voltammetry, complemented by X-ray diffraction analysis, IR spectroscopy, and OC, reveals that the reason for their formation is the cathodic reduction of heteronuclear tantalum and boron complexes.
|Journal||Russian journal of electrochemistry|
|Publication status||Published - 2001|