Electrical Contact Formation in Micro Four‐Point Probe Measurements

Steven Folkersma*, Janusz Bogdanowicz, Dirch Hjorth Petersen, Ole Hansen, Henrik Hartmann Henrichsen, Peter Former Nielsen, Lior Shiv, Wilfried Vandervorst

*Corresponding author for this work

Research output: Contribution to journalJournal articleResearchpeer-review

Abstract

This paper describes the electrical contact formation between the electrodes of the micro four‐point technique and a semiconducting sample. It is shown that the contact is formed in two stages: a voltage‐induced electrical contact formation, followed by a current‐induced decrease in contact resistance. Moreover, a methjavascript:void(0);od is proposed allowing for precise control of the final contact resistance. Finally, it is demonstrated that the contacting process is similar on one‐dimensional fin structures, where the demonstrated control of the electrical contact is needed when measuring on nanometer‐wide fins in arrays with a pitch smaller than the electrode contact size.
Original languageEnglish
JournalPhysica Status Solidi. A: Applications and Materials Science (Online)
ISSN1862-6319
DOIs
Publication statusAccepted/In press - 2020

Keywords

  • Micro four-point probe
  • FinFET
  • Electrical contact

Cite this