Electrical Contact Formation in Micro Four‐Point Probe Measurements

Steven Folkersma*, Janusz Bogdanowicz, Dirch Hjorth Petersen, Ole Hansen, Henrik Hartmann Henrichsen, Peter Former Nielsen, Lior Shiv, Wilfried Vandervorst

*Corresponding author for this work

Research output: Contribution to journalJournal articleResearchpeer-review

Abstract

This paper describes the electrical contact formation between the electrodes of the micro four‐point technique and a semiconducting sample. It is shown that the contact is formed in two stages: a voltage‐induced electrical contact formation, followed by a current‐induced decrease in contact resistance. Moreover, a methjavascript:void(0);od is proposed allowing for precise control of the final contact resistance. Finally, it is demonstrated that the contacting process is similar on one‐dimensional fin structures, where the demonstrated control of the electrical contact is needed when measuring on nanometer‐wide fins in arrays with a pitch smaller than the electrode contact size.
Original languageEnglish
JournalPhysica Status Solidi. A: Applications and Materials Science (Online)
ISSN1862-6319
DOIs
Publication statusAccepted/In press - 2020

Keywords

  • Micro four-point probe
  • FinFET
  • Electrical contact

Cite this

Folkersma, Steven ; Bogdanowicz, Janusz ; Petersen, Dirch Hjorth ; Hansen, Ole ; Henrichsen, Henrik Hartmann ; Nielsen, Peter Former ; Shiv, Lior ; Vandervorst, Wilfried. / Electrical Contact Formation in Micro Four‐Point Probe Measurements. In: Physica Status Solidi. A: Applications and Materials Science (Online). 2020.
@article{c1bbe13696aa414c962b199c1cb817b7,
title = "Electrical Contact Formation in Micro Four‐Point Probe Measurements",
abstract = "This paper describes the electrical contact formation between the electrodes of the micro four‐point technique and a semiconducting sample. It is shown that the contact is formed in two stages: a voltage‐induced electrical contact formation, followed by a current‐induced decrease in contact resistance. Moreover, a methjavascript:void(0);od is proposed allowing for precise control of the final contact resistance. Finally, it is demonstrated that the contacting process is similar on one‐dimensional fin structures, where the demonstrated control of the electrical contact is needed when measuring on nanometer‐wide fins in arrays with a pitch smaller than the electrode contact size.",
keywords = "Micro four-point probe, FinFET, Electrical contact",
author = "Steven Folkersma and Janusz Bogdanowicz and Petersen, {Dirch Hjorth} and Ole Hansen and Henrichsen, {Henrik Hartmann} and Nielsen, {Peter Former} and Lior Shiv and Wilfried Vandervorst",
year = "2020",
doi = "10.1002/pssa.201900579",
language = "English",
journal = "Physica Status Solidi. A: Applications and Materials Science (Online)",
issn = "1862-6319",
publisher = "Wiley - V C H Verlag GmbH & Co. KGaA",

}

Electrical Contact Formation in Micro Four‐Point Probe Measurements. / Folkersma, Steven; Bogdanowicz, Janusz; Petersen, Dirch Hjorth; Hansen, Ole; Henrichsen, Henrik Hartmann; Nielsen, Peter Former; Shiv, Lior; Vandervorst, Wilfried.

In: Physica Status Solidi. A: Applications and Materials Science (Online), 2020.

Research output: Contribution to journalJournal articleResearchpeer-review

TY - JOUR

T1 - Electrical Contact Formation in Micro Four‐Point Probe Measurements

AU - Folkersma, Steven

AU - Bogdanowicz, Janusz

AU - Petersen, Dirch Hjorth

AU - Hansen, Ole

AU - Henrichsen, Henrik Hartmann

AU - Nielsen, Peter Former

AU - Shiv, Lior

AU - Vandervorst, Wilfried

PY - 2020

Y1 - 2020

N2 - This paper describes the electrical contact formation between the electrodes of the micro four‐point technique and a semiconducting sample. It is shown that the contact is formed in two stages: a voltage‐induced electrical contact formation, followed by a current‐induced decrease in contact resistance. Moreover, a methjavascript:void(0);od is proposed allowing for precise control of the final contact resistance. Finally, it is demonstrated that the contacting process is similar on one‐dimensional fin structures, where the demonstrated control of the electrical contact is needed when measuring on nanometer‐wide fins in arrays with a pitch smaller than the electrode contact size.

AB - This paper describes the electrical contact formation between the electrodes of the micro four‐point technique and a semiconducting sample. It is shown that the contact is formed in two stages: a voltage‐induced electrical contact formation, followed by a current‐induced decrease in contact resistance. Moreover, a methjavascript:void(0);od is proposed allowing for precise control of the final contact resistance. Finally, it is demonstrated that the contacting process is similar on one‐dimensional fin structures, where the demonstrated control of the electrical contact is needed when measuring on nanometer‐wide fins in arrays with a pitch smaller than the electrode contact size.

KW - Micro four-point probe

KW - FinFET

KW - Electrical contact

U2 - 10.1002/pssa.201900579

DO - 10.1002/pssa.201900579

M3 - Journal article

JO - Physica Status Solidi. A: Applications and Materials Science (Online)

JF - Physica Status Solidi. A: Applications and Materials Science (Online)

SN - 1862-6319

ER -