Herein, the electrical contact formation between the electrodes of the micro four‐point technique and a semiconducting sample is described. It is shown that the contact is formed in two stages: a voltage‐induced electrical contact formation, followed by a current‐induced decrease in contact resistance. Moreover, a method is proposed allowing for precise control of the final contact resistance. Finally, it is demonstrated that the contacting process is similar on 1D fin structures, where the demonstrated control of the electrical contact is needed while measuring on nanometer‐wide fins in arrays with a pitch smaller than the electrode contact size.
|Journal||Physica Status Solidi. A: Applications and Materials Science (Online)|
|Number of pages||5|
|Publication status||Published - 2020|
- Micro four-point probe
- Electrical contact