Electrical Contact Formation in Micro Four‐Point Probe Measurements

Steven Folkersma*, Janusz Bogdanowicz, Dirch Hjorth Petersen, Ole Hansen, Henrik Hartmann Henrichsen, Peter Former Nielsen, Lior Shiv, Wilfried Vandervorst

*Corresponding author for this work

Research output: Contribution to journalJournal articleResearchpeer-review

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Abstract

Herein, the electrical contact formation between the electrodes of the micro four‐point technique and a semiconducting sample is described. It is shown that the contact is formed in two stages: a voltage‐induced electrical contact formation, followed by a current‐induced decrease in contact resistance. Moreover, a method is proposed allowing for precise control of the final contact resistance. Finally, it is demonstrated that the contacting process is similar on 1D fin structures, where the demonstrated control of the electrical contact is needed while measuring on nanometer‐wide fins in arrays with a pitch smaller than the electrode contact size.
Original languageEnglish
Article number1900579
JournalPhysica Status Solidi. A: Applications and Materials Science (Online)
Volume217
Issue number5
Number of pages5
ISSN1862-6319
DOIs
Publication statusPublished - 2020

Keywords

  • Micro four-point probe
  • FinFET
  • Electrical contact

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