Electrical and structural properties of La0.8Sr0.2Mn0.5Co0.5O3±δ films produced by pulsed laser deposition

Nini Pryds; Bo Toftmann Christensen; Jørgen Schou; P.V. Hendriksen; Søren Linderoth

doi:10.1016/j.apsusc.2005.01.168

Electrical and structural properties of La0.8Sr0.2Mn0.5Co0.5O3±δ films produced by pulsed laser deposition

Nini Pryds, Bo Toftmann Christensen, Jørgen Schou, P.V. Hendriksen, Søren Linderoth

Research output: Contribution to journal › Conference article › Research › peer-review

Abstract

La0.8Sr0.2Mn0.5Co0.5O3 (LSMCO) films for the use as contact layers or protective coatings in solid oxide fuel cells (SOFC) have been deposited on glass substrates by pulsed laser deposition (PLD). PLD is an obvious technique for thin film production of complex oxides, because of the ability to transfer material stoichiometrically from a multicomponent target to a growing film. In the present study, films were deposited at substrate temperatures of 473 and 573 K and in different oxygen background pressures. The influence of the process parameters, in particular of the oxygen background gas pressure, on the electrical conductivity and structure of the films is investigated. (c) 2005 Elsevier B.V. All rights reserved.

Original language	English
Journal	Applied Surface Science
Volume	247
Issue number	1-4
Pages (from-to)	466-470
ISSN	0169-4332
DOIs	https://doi.org/10.1016/j.apsusc.2005.01.168
Publication status	Published - 2005
Event	European Materials Research Society 2004 : Symposium N - Strasbourg, France Duration: 24 May 2004 → 28 May 2004

Conference

Conference	European Materials Research Society 2004
Country/Territory	France
City	Strasbourg
Period	24/05/2004 → 28/05/2004

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title = "Electrical and structural properties of La0.8Sr0.2Mn0.5Co0.5O3±δ films produced by pulsed laser deposition",

abstract = "La0.8Sr0.2Mn0.5Co0.5O3 (LSMCO) films for the use as contact layers or protective coatings in solid oxide fuel cells (SOFC) have been deposited on glass substrates by pulsed laser deposition (PLD). PLD is an obvious technique for thin film production of complex oxides, because of the ability to transfer material stoichiometrically from a multicomponent target to a growing film. In the present study, films were deposited at substrate temperatures of 473 and 573 K and in different oxygen background pressures. The influence of the process parameters, in particular of the oxygen background gas pressure, on the electrical conductivity and structure of the films is investigated. (c) 2005 Elsevier B.V. All rights reserved. ",

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language = "English",

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T1 - Electrical and structural properties of La0.8Sr0.2Mn0.5Co0.5O3±δ films produced by pulsed laser deposition

AU - Pryds, Nini

AU - Christensen, Bo Toftmann

AU - Schou, Jørgen

AU - Hendriksen, P.V.

AU - Linderoth, Søren

PY - 2005

Y1 - 2005

N2 - La0.8Sr0.2Mn0.5Co0.5O3 (LSMCO) films for the use as contact layers or protective coatings in solid oxide fuel cells (SOFC) have been deposited on glass substrates by pulsed laser deposition (PLD). PLD is an obvious technique for thin film production of complex oxides, because of the ability to transfer material stoichiometrically from a multicomponent target to a growing film. In the present study, films were deposited at substrate temperatures of 473 and 573 K and in different oxygen background pressures. The influence of the process parameters, in particular of the oxygen background gas pressure, on the electrical conductivity and structure of the films is investigated. (c) 2005 Elsevier B.V. All rights reserved.

AB - La0.8Sr0.2Mn0.5Co0.5O3 (LSMCO) films for the use as contact layers or protective coatings in solid oxide fuel cells (SOFC) have been deposited on glass substrates by pulsed laser deposition (PLD). PLD is an obvious technique for thin film production of complex oxides, because of the ability to transfer material stoichiometrically from a multicomponent target to a growing film. In the present study, films were deposited at substrate temperatures of 473 and 573 K and in different oxygen background pressures. The influence of the process parameters, in particular of the oxygen background gas pressure, on the electrical conductivity and structure of the films is investigated. (c) 2005 Elsevier B.V. All rights reserved.

KW - BRB

U2 - 10.1016/j.apsusc.2005.01.168

DO - 10.1016/j.apsusc.2005.01.168

M3 - Conference article

SN - 0169-4332

VL - 247

SP - 466

EP - 470

JO - Applied Surface Science

JF - Applied Surface Science

IS - 1-4

T2 - European Materials Research Society 2004

Y2 - 24 May 2004 through 28 May 2004

ER -

Electrical and structural properties of La0.8Sr0.2Mn0.5Co0.5O3±δ films produced by pulsed laser deposition

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