Efficient Excitation of Channel Plasmons in Tailored, UV-Lithography-Defined V-Grooves

Cameron L. C. Smith; Anil Haraksingh Thilsted; Cesar E. Garcia-Ortiz; Ilya P. Radko; Rodolphe  Marie; Claus Jeppesen; Christoph Vannahme; Sergey I. Bozhevolnyi; Anders Kristensen

doi:10.1021/nl5002058

Efficient Excitation of Channel Plasmons in Tailored, UV-Lithography-Defined V-Grooves

Cameron L. C. Smith, Anil Haraksingh Thilsted, Cesar E. Garcia-Ortiz, Ilya P. Radko, Rodolphe Marie, Claus Jeppesen, Christoph Vannahme, Sergey I. Bozhevolnyi, Anders Kristensen

University of Southern Denmark

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Abstract

We demonstrate the highly efficient (>50%) conversion of freely propagating light to channel plasmon-polaritons (CPPs) in gold V-groove waveguides using compact 1.6 μm long waveguide-termination coupling mirrors. Our straightforward fabrication process, involving UV-lithography and crystallographic silicon etching, forms the coupling mirrors innately and ensures exceptional-quality, wafer-scale device production. We tailor the V-shaped profiles by thermal silicon oxidation in order to shift initially wedge-located modes downward into the V-grooves, resulting in well-confined CPPs suitable for nanophotonic applications.

Original language	English
Journal	International Nano Letters
Volume	14
Issue number	3
Pages (from-to)	1659-1664
ISSN	1530-6992
DOIs	https://doi.org/10.1021/nl5002058
Publication status	Published - 2014

Keywords

Channel plasmon polariton
V-groove
Termination mirror
Plasmonic coupler
UV lithography

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title = "Efficient Excitation of Channel Plasmons in Tailored, UV-Lithography-Defined V-Grooves",

abstract = "We demonstrate the highly efficient (>50%) conversion of freely propagating light to channel plasmon-polaritons (CPPs) in gold V-groove waveguides using compact 1.6 μm long waveguide-termination coupling mirrors. Our straightforward fabrication process, involving UV-lithography and crystallographic silicon etching, forms the coupling mirrors innately and ensures exceptional-quality, wafer-scale device production. We tailor the V-shaped profiles by thermal silicon oxidation in order to shift initially wedge-located modes downward into the V-grooves, resulting in well-confined CPPs suitable for nanophotonic applications.",

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author = "Smith, {Cameron L. C.} and Thilsted, {Anil Haraksingh} and Garcia-Ortiz, {Cesar E.} and Radko, {Ilya P.} and Rodolphe Marie and Claus Jeppesen and Christoph Vannahme and Bozhevolnyi, {Sergey I.} and Anders Kristensen",

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AU - Smith, Cameron L. C.

AU - Thilsted, Anil Haraksingh

AU - Garcia-Ortiz, Cesar E.

AU - Radko, Ilya P.

AU - Marie, Rodolphe

AU - Jeppesen, Claus

AU - Vannahme, Christoph

AU - Bozhevolnyi, Sergey I.

AU - Kristensen, Anders

PY - 2014

Y1 - 2014

N2 - We demonstrate the highly efficient (>50%) conversion of freely propagating light to channel plasmon-polaritons (CPPs) in gold V-groove waveguides using compact 1.6 μm long waveguide-termination coupling mirrors. Our straightforward fabrication process, involving UV-lithography and crystallographic silicon etching, forms the coupling mirrors innately and ensures exceptional-quality, wafer-scale device production. We tailor the V-shaped profiles by thermal silicon oxidation in order to shift initially wedge-located modes downward into the V-grooves, resulting in well-confined CPPs suitable for nanophotonic applications.

AB - We demonstrate the highly efficient (>50%) conversion of freely propagating light to channel plasmon-polaritons (CPPs) in gold V-groove waveguides using compact 1.6 μm long waveguide-termination coupling mirrors. Our straightforward fabrication process, involving UV-lithography and crystallographic silicon etching, forms the coupling mirrors innately and ensures exceptional-quality, wafer-scale device production. We tailor the V-shaped profiles by thermal silicon oxidation in order to shift initially wedge-located modes downward into the V-grooves, resulting in well-confined CPPs suitable for nanophotonic applications.

KW - Channel plasmon polariton

KW - V-groove

KW - Termination mirror

KW - Plasmonic coupler

KW - UV lithography

U2 - 10.1021/nl5002058

DO - 10.1021/nl5002058

M3 - Journal article

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VL - 14

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EP - 1664

JO - International Nano Letters

JF - International Nano Letters

IS - 3

ER -

Efficient Excitation of Channel Plasmons in Tailored, UV-Lithography-Defined V-Grooves

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