Efficient Excitation of Channel Plasmons in Tailored, UV-Lithography-Defined V-Grooves

Cameron L. C. Smith, Anil Haraksingh Thilsted, Cesar E. Garcia-Ortiz, Ilya P. Radko, Rodolphe Marie, Claus Jeppesen, Christoph Vannahme, Sergey I. Bozhevolnyi, Anders Kristensen

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Abstract

We demonstrate the highly efficient (>50%) conversion of freely propagating light to channel plasmon-polaritons (CPPs) in gold V-groove waveguides using compact 1.6 μm long waveguide-termination coupling mirrors. Our straightforward fabrication process, involving UV-lithography and crystallographic silicon etching, forms the coupling mirrors innately and ensures exceptional-quality, wafer-scale device production. We tailor the V-shaped profiles by thermal silicon oxidation in order to shift initially wedge-located modes downward into the V-grooves, resulting in well-confined CPPs suitable for nanophotonic applications.
Original languageEnglish
JournalInternational Nano Letters
Volume14
Issue number3
Pages (from-to)1659-1664
ISSN1530-6992
DOIs
Publication statusPublished - 2014

Keywords

  • Channel plasmon polariton
  • V-groove
  • Termination mirror
  • Plasmonic coupler
  • UV lithography

Cite this

Smith, Cameron L. C. ; Thilsted, Anil Haraksingh ; Garcia-Ortiz, Cesar E. ; Radko, Ilya P. ; Marie, Rodolphe ; Jeppesen, Claus ; Vannahme, Christoph ; Bozhevolnyi, Sergey I. ; Kristensen, Anders. / Efficient Excitation of Channel Plasmons in Tailored, UV-Lithography-Defined V-Grooves. In: International Nano Letters. 2014 ; Vol. 14, No. 3. pp. 1659-1664.
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title = "Efficient Excitation of Channel Plasmons in Tailored, UV-Lithography-Defined V-Grooves",
abstract = "We demonstrate the highly efficient (>50{\%}) conversion of freely propagating light to channel plasmon-polaritons (CPPs) in gold V-groove waveguides using compact 1.6 μm long waveguide-termination coupling mirrors. Our straightforward fabrication process, involving UV-lithography and crystallographic silicon etching, forms the coupling mirrors innately and ensures exceptional-quality, wafer-scale device production. We tailor the V-shaped profiles by thermal silicon oxidation in order to shift initially wedge-located modes downward into the V-grooves, resulting in well-confined CPPs suitable for nanophotonic applications.",
keywords = "Channel plasmon polariton, V-groove, Termination mirror, Plasmonic coupler, UV lithography",
author = "Smith, {Cameron L. C.} and Thilsted, {Anil Haraksingh} and Garcia-Ortiz, {Cesar E.} and Radko, {Ilya P.} and Rodolphe Marie and Claus Jeppesen and Christoph Vannahme and Bozhevolnyi, {Sergey I.} and Anders Kristensen",
year = "2014",
doi = "10.1021/nl5002058",
language = "English",
volume = "14",
pages = "1659--1664",
journal = "International Nano Letters",
issn = "2008-9295",
publisher = "Islamic Azad University. Kermansha",
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Smith, CLC, Thilsted, AH, Garcia-Ortiz, CE, Radko, IP, Marie, R, Jeppesen, C, Vannahme, C, Bozhevolnyi, SI & Kristensen, A 2014, 'Efficient Excitation of Channel Plasmons in Tailored, UV-Lithography-Defined V-Grooves', International Nano Letters, vol. 14, no. 3, pp. 1659-1664. https://doi.org/10.1021/nl5002058

Efficient Excitation of Channel Plasmons in Tailored, UV-Lithography-Defined V-Grooves. / Smith, Cameron L. C.; Thilsted, Anil Haraksingh; Garcia-Ortiz, Cesar E.; Radko, Ilya P.; Marie, Rodolphe ; Jeppesen, Claus; Vannahme, Christoph; Bozhevolnyi, Sergey I.; Kristensen, Anders.

In: International Nano Letters, Vol. 14, No. 3, 2014, p. 1659-1664.

Research output: Contribution to journalJournal articleResearchpeer-review

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AU - Smith, Cameron L. C.

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AU - Garcia-Ortiz, Cesar E.

AU - Radko, Ilya P.

AU - Marie, Rodolphe

AU - Jeppesen, Claus

AU - Vannahme, Christoph

AU - Bozhevolnyi, Sergey I.

AU - Kristensen, Anders

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KW - Channel plasmon polariton

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KW - Termination mirror

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KW - UV lithography

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