Effects of steps and defects on O2 dissociation on clean and modified Cu(100)

M. Hirsimaki, Ib Chorkendorff

Research output: Contribution to journalJournal articleResearchpeer-review

Abstract

Dissociative chemisorption of O-2 on Cu(100), S/Cu(100) and Ag/Cu(100) surface alloy has been investigated by Auger electron spectroscopy (AES). A strong reduction in the initial O-2 chemisorption probability (S-0) from 0.05 to 7.4 x 10(-3) is observed already at an Ag coverage of 0.02 ML. Further Ag deposition results only in a moderate decrease in So. Similar inhibition of O-2 dissociation is observed on S/Cu(100). It is concluded that at very low Ag coverages, the reduced reactivity of Ag/Cu(100) towards O-2 dissociation is primarily due to the steric blocking of the surface defects and that any electronic effects are only secondary and present only at higher Ag coverages.
Original languageEnglish
JournalSurf. Sci.
Volume538
Issue number3
Pages (from-to)233-239
ISSN0039-6028
Publication statusPublished - 2003

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