Effect of B+ Flux on the electrical activation of ultra-shallow B+ implants in Ge

B.R. Yates, B.L. Darby, Dirch Hjorth Petersen, Ole Hansen, R. Lin, P.F. Nielsen, B.L. Doyle, A. Kontos, K.S. Jones

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Abstract

The residual implanted dose of ultra-shallow B+ implants in Ge was characterized using elastic recoil detection and was determined to correlate well with simulations with a dose loss of 23% due to ion backscattering for 2 keV implants in Ge. The electrical characterization of ultra-shallow B+ implants at 2 keV to a dose of 5.0×1014 cm-2 at beam currents ranging from 0.4 to 6.4 mA has been studied using micro Hall effect measurements after annealing at 400°C for 60 s. It has been shown that the sheet number increases with beam current across the investigated range with electrical activation being 76% higher at 6.4 mA as compared to 0.4mA. However, at 6.4 mA, the electrically active fraction remained low at 11.4%. Structural characterization revealed that the implanted region remained crystalline and amorphization is not able to explain the increased activation. The results suggest the presence of a stable B:Ge cluster whose formation is altered by point defect recombination during high flux implantation which results in increased B activation. © The Electrochemical Society.

Original languageEnglish
Title of host publicationECS Transactions
PublisherThe Electrochemical Society
Publication date2012
Pages543-549
ISBN (Print)9781607683575
DOIs
Publication statusPublished - 2012
Event220th ECS Meeting and Electrochemical Energy Summit - Westin Boston Waterfront and the Boston Convention and Exhibition Center, Boston, United States
Duration: 9 Oct 201114 Oct 2011
Conference number: 220
http://www.electrochem.org/meetings/biannual/220/220.htm

Conference

Conference220th ECS Meeting and Electrochemical Energy Summit
Number220
LocationWestin Boston Waterfront and the Boston Convention and Exhibition Center
CountryUnited States
CityBoston
Period09/10/201114/10/2011
Internet address

Keywords

  • Point defects
  • Silicon alloys
  • Germanium

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