Dry etching of SiO₂ nanostructures via Reactive Ion Etching using SF₆

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Original language	English
Publication date	2024
Number of pages	1
Publication status	Published - 2024
Event	50^thInternational Micro and Nano Engineering Conference - Montpellier, France Duration: 16 Sept 2024 → 19 Sept 2024 Conference number: 50

Conference	50^thInternational Micro and Nano Engineering Conference
Number	50
Country/Territory	France
City	Montpellier
Period	16/09/2024 → 19/09/2024

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@conference{6b1ea98d8c04416ab0c18130c502e214,

title = "Dry etching of SiO₂ nanostructures via Reactive Ion Etching using SF₆",

author = "Marc Bernet and Chantal Silvestre and J{\"o}rg H{\"u}bner and Rafael Taboryski and Henri Jansen",

year = "2024",

language = "English",

note = "50<sup>th </sup>International Micro and Nano Engineering Conference, MNE 2024 ; Conference date: 16-09-2024 Through 19-09-2024",

}

TY - CONF

T1 - Dry etching of SiO₂ nanostructures via Reactive Ion Etching using SF₆

AU - Bernet, Marc

AU - Silvestre, Chantal

AU - Hübner, Jörg

AU - Taboryski, Rafael

AU - Jansen, Henri

N1 - Conference code: 50

PY - 2024

Y1 - 2024

M3 - Poster

T2 - 50<sup>th </sup>International Micro and Nano Engineering Conference

Y2 - 16 September 2024 through 19 September 2024

ER -