Double layer resist process scheme for metal lift-off with application in inductive heating of microstructures

Lassana Ouattara, Michael Knutzen, Stephan Urs Keller, M. F. Hansen, Anja Boisen

    Research output: Contribution to journalJournal articleResearchpeer-review

    Abstract

    We present a new method to define metal electrodes on top of high-aspect-ratio microstructures using standard photolithography equipment and a single chromium mask. A lift-off resist (LOR) layer is implemented in an SU-8 photolithography process to selectively remove metal at the end of the processing. In this way, we have successfully defined metal electrodes on top of 75 mu m high SU-8 microstructures to be used as test structures for the measurement of temperature increase due to inductive heating.
    Original languageEnglish
    JournalMicroelectronic Engineering
    Volume87
    Issue number5-8
    Pages (from-to)1226-1228
    ISSN0167-9317
    DOIs
    Publication statusPublished - 2010

    Keywords

    • Double layer LOR/positive photoresist lift-off
    • SU-8 microfabrication
    • Metallization of high-aspect-ratio structures

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