Dopant profiling of focused ion beam milled semiconductors using off-axis electron holography; reducing artifacts, extending detection limits and reducing the effects of gallium implantation

David Cooper, Cyril Ailliot, Jean-Paul Barnes, Jean-Michel Hartmann, Phillipe Salles, Gerard Benassayag, Rafal E. Dunin-Borkowski

    Research output: Contribution to journal › Journal article › Research › peer-review

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