Directly UV written silica-on-silicon planar waveguides with low insertion loss

Dan Zauner; Mikael Svalgaard; Martin Kristensen

doi:10.1109/OFC.1998.657285

Directly UV written silica-on-silicon planar waveguides with low insertion loss

Dan Zauner
, Mikael Svalgaard
, Martin Kristensen

Research output: Chapter in Book/Report/Conference proceeding › Article in proceedings › Research › peer-review

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Abstract

The photosensitive properties of germanosilica may be utilized to directly induce waveguide patterns into thin-film structures using ultraviolet (UV) light. The advantages of fabricating planar waveguides with UV light include the absence of photolithography and reactive ion etching, flexibility in waveguide geometry, and excellent control of the refractive index step. Direct UV writing of waveguides became a realistic alternative to other fabrication methods when propagation losses below 0.2 dB/cm were reported in single-mode waveguides. However, the coupling loss to optical fibers remained high, typically 1.8 dB/facet, which is significantly more than that obtained with other techniques. In this paper we present results in which the coupling loss to optical fibers has been lowered substantially. In addition, the glass photosensitivity has been increased, thus permitting shorter fabrication times

Original language	English
Title of host publication	Technical Digest Optical Fiber Communication Conference and Exhibit
Publisher	IEEE
Publication date	1998
Pages	149-150
ISBN (Print)	1-55752-521-8
DOIs	https://doi.org/10.1109/OFC.1998.657285
Publication status	Published - 1998
Event	1998 Optical Fiber Communication Conference and Exhibit - San Jose, CA, United States Duration: 22 Feb 1998 → 27 Feb 1998 http://ieeexplore.ieee.org/xpl/mostRecentIssue.jsp?punumber=5284

Conference

Conference	1998 Optical Fiber Communication Conference and Exhibit
Country/Territory	United States
City	San Jose, CA
Period	22/02/1998 → 27/02/1998
Internet address	http://ieeexplore.ieee.org/xpl/mostRecentIssue.jsp?punumber=5284

Bibliographical note

Copyright 1998 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.

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title = "Directly UV written silica-on-silicon planar waveguides with low insertion loss",

abstract = "The photosensitive properties of germanosilica may be utilized to directly induce waveguide patterns into thin-film structures using ultraviolet (UV) light. The advantages of fabricating planar waveguides with UV light include the absence of photolithography and reactive ion etching, flexibility in waveguide geometry, and excellent control of the refractive index step. Direct UV writing of waveguides became a realistic alternative to other fabrication methods when propagation losses below 0.2 dB/cm were reported in single-mode waveguides. However, the coupling loss to optical fibers remained high, typically 1.8 dB/facet, which is significantly more than that obtained with other techniques. In this paper we present results in which the coupling loss to optical fibers has been lowered substantially. In addition, the glass photosensitivity has been increased, thus permitting shorter fabrication times",

author = "Dan Zauner and Mikael Svalgaard and Martin Kristensen",

note = "Copyright 1998 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.; 1998 Optical Fiber Communication Conference and Exhibit, OFC '98 ; Conference date: 22-02-1998 Through 27-02-1998",

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AU - Zauner, Dan

AU - Svalgaard, Mikael

AU - Kristensen, Martin

N1 - Copyright 1998 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.

PY - 1998

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N2 - The photosensitive properties of germanosilica may be utilized to directly induce waveguide patterns into thin-film structures using ultraviolet (UV) light. The advantages of fabricating planar waveguides with UV light include the absence of photolithography and reactive ion etching, flexibility in waveguide geometry, and excellent control of the refractive index step. Direct UV writing of waveguides became a realistic alternative to other fabrication methods when propagation losses below 0.2 dB/cm were reported in single-mode waveguides. However, the coupling loss to optical fibers remained high, typically 1.8 dB/facet, which is significantly more than that obtained with other techniques. In this paper we present results in which the coupling loss to optical fibers has been lowered substantially. In addition, the glass photosensitivity has been increased, thus permitting shorter fabrication times

AB - The photosensitive properties of germanosilica may be utilized to directly induce waveguide patterns into thin-film structures using ultraviolet (UV) light. The advantages of fabricating planar waveguides with UV light include the absence of photolithography and reactive ion etching, flexibility in waveguide geometry, and excellent control of the refractive index step. Direct UV writing of waveguides became a realistic alternative to other fabrication methods when propagation losses below 0.2 dB/cm were reported in single-mode waveguides. However, the coupling loss to optical fibers remained high, typically 1.8 dB/facet, which is significantly more than that obtained with other techniques. In this paper we present results in which the coupling loss to optical fibers has been lowered substantially. In addition, the glass photosensitivity has been increased, thus permitting shorter fabrication times

U2 - 10.1109/OFC.1998.657285

DO - 10.1109/OFC.1998.657285

M3 - Article in proceedings

SN - 1-55752-521-8

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EP - 150

BT - Technical Digest Optical Fiber Communication Conference and Exhibit

PB - IEEE

T2 - 1998 Optical Fiber Communication Conference and Exhibit

Y2 - 22 February 1998 through 27 February 1998

ER -

Directly UV written silica-on-silicon planar waveguides with low insertion loss

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