Directly UV written silica-on-silicon planar waveguides with low insertion loss

Dan Zauner, Mikael Svalgaard, Martin Kristensen

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    Abstract

    The photosensitive properties of germanosilica may be utilized to directly induce waveguide patterns into thin-film structures using ultraviolet (UV) light. The advantages of fabricating planar waveguides with UV light include the absence of photolithography and reactive ion etching, flexibility in waveguide geometry, and excellent control of the refractive index step. Direct UV writing of waveguides became a realistic alternative to other fabrication methods when propagation losses below 0.2 dB/cm were reported in single-mode waveguides. However, the coupling loss to optical fibers remained high, typically 1.8 dB/facet, which is significantly more than that obtained with other techniques. In this paper we present results in which the coupling loss to optical fibers has been lowered substantially. In addition, the glass photosensitivity has been increased, thus permitting shorter fabrication times
    Original languageEnglish
    Title of host publicationTechnical Digest Optical Fiber Communication Conference and Exhibit
    PublisherIEEE
    Publication date1998
    Pages149-150
    ISBN (Print)1-55752-521-8
    DOIs
    Publication statusPublished - 1998
    Event1998 Optical Fiber Communication Conference and Exhibit - San Jose, CA, United States
    Duration: 22 Feb 199827 Feb 1998
    http://ieeexplore.ieee.org/xpl/mostRecentIssue.jsp?punumber=5284

    Conference

    Conference1998 Optical Fiber Communication Conference and Exhibit
    CountryUnited States
    CitySan Jose, CA
    Period22/02/199827/02/1998
    Internet address

    Bibliographical note

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