Abstract
We present the results on experimental studies of the directional radiation from GaAs quantum dots in AlGaAs nanowires grown by molecular beam epitaxy technique on silicon surface. It was shown that the radiation intensity from GaAs quantum dots in the direction of nanowires growth is 2 orders of magnitude higher than the intensity of radiation in the perpendicular direction.
Original language | English |
---|---|
Journal | Technical Physics Letters |
Volume | 47 |
Issue number | 8 |
Pages (from-to) | 47–50 |
ISSN | 1063-7850 |
DOIs | |
Publication status | Published - 2021 |
Keywords
- Directional radiation
- Microphotoluminescence
- Molecular beam epitaxy
- Nanowires
- Wuantum dots
- Semiconductors