Abstract
| Original language | English |
|---|---|
| Journal | Nanoscale |
| Volume | 10 |
| Issue number | 38 |
| Pages (from-to) | 18306-18314 |
| ISSN | 2040-3364 |
| DOIs | |
| Publication status | Published - 2018 |
Cite this
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Directed self-assembly of a high-chi block copolymer for the fabrication of optical nanoresonators. / Rasappa, Sozaraj; Schulte, Lars; Ndoni, Sokol; Niemi, Tapio.
In: Nanoscale, Vol. 10, No. 38, 2018, p. 18306-18314.Research output: Contribution to journal › Journal article › Research › peer-review
TY - JOUR
T1 - Directed self-assembly of a high-chi block copolymer for the fabrication of optical nanoresonators
AU - Rasappa, Sozaraj
AU - Schulte, Lars
AU - Ndoni, Sokol
AU - Niemi, Tapio
PY - 2018
Y1 - 2018
N2 - In this paper, we report on the fabrication of optical nanoresonators using block copolymer lithography. The nanostructured gratings or nanofins were fabricated using a silicon-containing block copolymer on a chromium coated silicon-on-insulator substrate. The etch resistance of the block copolymer template enables a unique patterning technique for high-aspect-ratio silicon nanofins. Integration of the directed self-assembly with nanoimprint lithography provides a well-aligned array of nanofins with a depth of ∼125 nm on a wafer scale. The developed nanopatterning method is an alternative to the previously reported nanopatterning techniques utilizing block copolymers. A dense array of sub-10 nm nanofins is used to realize a photonic guided-mode resonance filter. The nanostructured grating provides high sensitivity in refractive index sensing, as demonstrated by simulations and experiments in measuring varying contents of the tetrahydrofuran solvent.
AB - In this paper, we report on the fabrication of optical nanoresonators using block copolymer lithography. The nanostructured gratings or nanofins were fabricated using a silicon-containing block copolymer on a chromium coated silicon-on-insulator substrate. The etch resistance of the block copolymer template enables a unique patterning technique for high-aspect-ratio silicon nanofins. Integration of the directed self-assembly with nanoimprint lithography provides a well-aligned array of nanofins with a depth of ∼125 nm on a wafer scale. The developed nanopatterning method is an alternative to the previously reported nanopatterning techniques utilizing block copolymers. A dense array of sub-10 nm nanofins is used to realize a photonic guided-mode resonance filter. The nanostructured grating provides high sensitivity in refractive index sensing, as demonstrated by simulations and experiments in measuring varying contents of the tetrahydrofuran solvent.
U2 - 10.1039/c8nr05831h
DO - 10.1039/c8nr05831h
M3 - Journal article
VL - 10
SP - 18306
EP - 18314
JO - Nanoscale
JF - Nanoscale
SN - 2040-3364
IS - 38
ER -