Directed self-assembly of a high-chi block copolymer for the fabrication of optical nanoresonators

Sozaraj Rasappa*, Lars Schulte, Sokol Ndoni, Tapio Niemi

*Corresponding author for this work

Research output: Contribution to journalJournal articleResearchpeer-review

Abstract

In this paper, we report on the fabrication of optical nanoresonators using block copolymer lithography. The nanostructured gratings or nanofins were fabricated using a silicon-containing block copolymer on a chromium coated silicon-on-insulator substrate. The etch resistance of the block copolymer template enables a unique patterning technique for high-aspect-ratio silicon nanofins. Integration of the directed self-assembly with nanoimprint lithography provides a well-aligned array of nanofins with a depth of ∼125 nm on a wafer scale. The developed nanopatterning method is an alternative to the previously reported nanopatterning techniques utilizing block copolymers. A dense array of sub-10 nm nanofins is used to realize a photonic guided-mode resonance filter. The nanostructured grating provides high sensitivity in refractive index sensing, as demonstrated by simulations and experiments in measuring varying contents of the tetrahydrofuran solvent.
Original languageEnglish
JournalNanoscale
Volume10
Issue number38
Pages (from-to)18306-18314
ISSN2040-3364
DOIs
Publication statusPublished - 2018

Cite this

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title = "Directed self-assembly of a high-chi block copolymer for the fabrication of optical nanoresonators",
abstract = "In this paper, we report on the fabrication of optical nanoresonators using block copolymer lithography. The nanostructured gratings or nanofins were fabricated using a silicon-containing block copolymer on a chromium coated silicon-on-insulator substrate. The etch resistance of the block copolymer template enables a unique patterning technique for high-aspect-ratio silicon nanofins. Integration of the directed self-assembly with nanoimprint lithography provides a well-aligned array of nanofins with a depth of ∼125 nm on a wafer scale. The developed nanopatterning method is an alternative to the previously reported nanopatterning techniques utilizing block copolymers. A dense array of sub-10 nm nanofins is used to realize a photonic guided-mode resonance filter. The nanostructured grating provides high sensitivity in refractive index sensing, as demonstrated by simulations and experiments in measuring varying contents of the tetrahydrofuran solvent.",
author = "Sozaraj Rasappa and Lars Schulte and Sokol Ndoni and Tapio Niemi",
year = "2018",
doi = "10.1039/c8nr05831h",
language = "English",
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pages = "18306--18314",
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publisher = "Royal Society of Chemistry",
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Directed self-assembly of a high-chi block copolymer for the fabrication of optical nanoresonators. / Rasappa, Sozaraj; Schulte, Lars; Ndoni, Sokol; Niemi, Tapio.

In: Nanoscale, Vol. 10, No. 38, 2018, p. 18306-18314.

Research output: Contribution to journalJournal articleResearchpeer-review

TY - JOUR

T1 - Directed self-assembly of a high-chi block copolymer for the fabrication of optical nanoresonators

AU - Rasappa, Sozaraj

AU - Schulte, Lars

AU - Ndoni, Sokol

AU - Niemi, Tapio

PY - 2018

Y1 - 2018

N2 - In this paper, we report on the fabrication of optical nanoresonators using block copolymer lithography. The nanostructured gratings or nanofins were fabricated using a silicon-containing block copolymer on a chromium coated silicon-on-insulator substrate. The etch resistance of the block copolymer template enables a unique patterning technique for high-aspect-ratio silicon nanofins. Integration of the directed self-assembly with nanoimprint lithography provides a well-aligned array of nanofins with a depth of ∼125 nm on a wafer scale. The developed nanopatterning method is an alternative to the previously reported nanopatterning techniques utilizing block copolymers. A dense array of sub-10 nm nanofins is used to realize a photonic guided-mode resonance filter. The nanostructured grating provides high sensitivity in refractive index sensing, as demonstrated by simulations and experiments in measuring varying contents of the tetrahydrofuran solvent.

AB - In this paper, we report on the fabrication of optical nanoresonators using block copolymer lithography. The nanostructured gratings or nanofins were fabricated using a silicon-containing block copolymer on a chromium coated silicon-on-insulator substrate. The etch resistance of the block copolymer template enables a unique patterning technique for high-aspect-ratio silicon nanofins. Integration of the directed self-assembly with nanoimprint lithography provides a well-aligned array of nanofins with a depth of ∼125 nm on a wafer scale. The developed nanopatterning method is an alternative to the previously reported nanopatterning techniques utilizing block copolymers. A dense array of sub-10 nm nanofins is used to realize a photonic guided-mode resonance filter. The nanostructured grating provides high sensitivity in refractive index sensing, as demonstrated by simulations and experiments in measuring varying contents of the tetrahydrofuran solvent.

U2 - 10.1039/c8nr05831h

DO - 10.1039/c8nr05831h

M3 - Journal article

VL - 10

SP - 18306

EP - 18314

JO - Nanoscale

JF - Nanoscale

SN - 2040-3364

IS - 38

ER -