Direct measurement of resistance of multiwalled carbon nanotubes using micro four-point probes

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    Abstract

    The electrical properties of multiwalled carbon nanotubes was investigated by micro four point probes, fabricated using conventional silicon microfabrication techniques. After positioning of chemical vapour deposition-grown multi-walled carbon nanotubes on a SiO2 substrate, the two- or four-point resistance at specific positions along the nanotubes, was measured by microprobes with different microelectrocle spacings. Individual nanotubes were investigated in more detail by measuring current as a function of bias voltage until the point of failure and the results are compared to previously reported findings, using conventional measurement techniques.
    Original languageEnglish
    JournalSensor Letters
    Volume3
    Issue number4
    Pages (from-to)300-303
    ISSN1546-198X
    DOIs
    Publication statusPublished - 2005

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